• Mclean, K. M.
• Oldham, J.
• Fong, C.
• James, M.
• Oiseth, S. K.
• Muir, Benjamin Ward
• Nelson, A.

Abstract

Radio-frequency glow-discharge plasma polymer thin films of allylamine (AA) and hexamethyldisiloxane (HMDSO) were prepared on silicon wafers and analyzed by a combination of X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), X-ray reflectometry (XRR), and neutron reflectometry (NR). AFM and XRR measurements revealed uniform, smooth, defect-free films of 20-30 nm thickness. XPS measurements gave compositional data on all elements in the films with the exception of hydrogen. In combination with XRR and NR, the film composition and mass densities (1.46 and 1.09 g cm(-)(3) for AA and HMDSO, respectively) were estimated. Further NR measurements were conducted with the AA and HMDSO films in contact with water at neutral pH. Three different H(2)O/D(2)O mixtures were used to vary the contrast between the aqueous phase and the polymer. The amount of water penetrating the film, as well as the number of labile protons present, was determined. The AA film in contact with water was found to swell by approximately 5%, contain approximately 3% water, and have approximately 24% labile protons. The HDMSO polymer was found to have approximately 6% labile protons, no thickness increase when in contact with water, and essentially no solvent penetration into the film. The difference in the degree of proton exchange within the films was attributed to the substantially different surface and bulk chemistries of the two films.

Topics

• surface
• polymer
• phase
• thin film
• x-ray photoelectron spectroscopy
• atomic force microscopy
• Hydrogen
• Silicon
• defect
• reflectometry