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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Hämäläinen, Jani Marko Antero
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (20/20 displayed)
- 2020Van der Waals epitaxy of continuous thin films of 2D materials using atomic layer deposition in low temperature and low vacuum conditionscitations
- 2019How insignificant modifications of photocatalysts can significantly change their photocatalytic activitycitations
- 2018Rhenium Metal and Rhenium Nitride Thin Films Grown by Atomic Layer Depositioncitations
- 2018Atomic Layer Deposition of Rhenium Disulfidecitations
- 2016Atomic Layer Deposition of Metal Phosphates and Lithium Silicates
- 2016Atomic Layer Deposition of Iridium Thin Films Using Sequential Oxygen and Hydrogen Pulsescitations
- 2016Nucleation and conformality of iridium and iridium oxide thin films grown by atomic layer depositioncitations
- 2014Atomic Layer Deposition of Noble Metals and Their Oxidescitations
- 2013Low temperature atomic layer deposition of noble metals using ozone and molecular hydrogen as reactantscitations
- 2012Study of amorphous lithium silicate thin films grown by atomic layer depositioncitations
- 2012Lithium Phosphate Thin Films Grown by Atomic Layer Depositioncitations
- 2012Atomic layer deposited iridium oxide thin film as microelectrode coating in stem cell applicationscitations
- 2011Iridium metal and iridium oxide thin films grown by atomic layer deposition at low temperaturescitations
- 2011Atomic Layer Deposition and Characterization of Aluminum Silicate Thin Films for Optical Applicationscitations
- 2010pH electrode based on ALD deposited iridium oxidecitations
- 2009Metallic Ir, IrO2 and Pt Nanotubes and Fibers by Electrospinning and Atomic Layer Deposition
- 2009Study on atomic layer deposition of amorphous rhodium oxide thin filmscitations
- 2009Atomic layer deposition of iridium thin films by consecutive oxidation and reduction stepscitations
- 2008Atomic layer deposition of iridium oxide thin films from Ir(acac)₃ and ozonecitations
- 2008Atomic layer deposition of platinum oxide and metallic platinum thin films from Pt(acac)₂ and ozonecitations
Places of action
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article
Atomic layer deposition of platinum oxide and metallic platinum thin films from Pt(acac)₂ and ozone
Abstract
Platinum oxide and platinum thin films have been grown by atomic layer deposition (ALD) using Pt(acac)(2) (acac = acetylacetonato) and ozone as precursors. Amorphous platinum oxide thin films were deposited at 120 and 130 degrees C while metallic platinum films were obtained at 140 degrees C and above. The sublimation temperature of Pt(acac)(2) set the low temperature limit for oxide film deposition. The platinum oxide films were successfully deposited on Al2O3 and TiO2 adhesion layers, soda lime glass, and silicon substrate with native oxide on top. Platinum films were grown on Al2O3 adhesion layer. The platinum oxide had good adhesion to all tested surfaces, whereas metallic platinum films did not pass the common tape test. Resistivities of 50-60 nm thick platinum oxide films were between 1.5 and 5 Omega cm at 130 degrees C and could be varied with both precursor pulse lengths. The resistivity of about 110 nm thick metallic film deposited at 140 degrees C was about 11 mu Omega cm. The platinum films deposited at higher temperatures suffered from deterioration of thickness uniformity. The platinum oxide films can be reduced in 5% H-2 gas under reduced pressure at room temperature to porous platinum structures.