| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Pore, Viljami
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (8/8 displayed)
- 2011Atomic Layer Deposition of GeTe
- 2010Silver Coated Platinum Core–Shell Nanostructures on Etched Si Nanowires: Atomic Layer Deposition (ALD) Processing and Application in SERScitations
- 2009Atomic layer deposition of metal tellurides and selenides using alkylsilyl compounds of tellurium and seleniumcitations
- 2009Alkylsilyl compounds of selenium and tellurium
- 2009Explosive crystallization in atomic layer deposited mixed titanium oxidescitations
- 2007Atomic layer deposition in nanotechnology applications
- 2007Atomic layer deposition of titanium disulfide thin filmscitations
- 2006Atomic layer deposition and properties of lanthanum oxide and lanthanum-aluminum oxide filmscitations
Places of action
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article
Explosive crystallization in atomic layer deposited mixed titanium oxides
Abstract
Anatase crystals with lateral sizes of tens of micrometers are impossible to prepare as thin films on amorphous substrates by normal thin film deposition techniques. When deposited on amorphous substrates, polycrystalline anatase titanium dioxide (TiO2) thin films have typically grain and crystal sizes comparable to the film thickness. We show that when a suitable amount of Nb2O5 or Ta2O5 is mixed with TiO2 using atomic layer deposition (ALD), upon postdeposition annealing large similar to 10-100 mu m sized anatase monocrystals are formed in films thinner than 100 nm on amorphous substrates. Such an exceptionally extensive lateral grain growth appears to be a result of explosive crystallization when amorphous Ti-Nb-O and Ti-Ta-O thin films are heated, a phenomenon that has not been reported before for TiO2 thin films. The prepared films will likely have a number of useful applications where well-ordered anatase surfaces are required, such as photocatalysis, and they also can be used as a transparent conducting oxide.