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Naji, M. |
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Motta, Antonella |
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Aletan, Dirar |
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Mohamed, Tarek |
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Ertürk, Emre |
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Taccardi, Nicola |
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Kononenko, Denys |
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Petrov, R. H. | Madrid |
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Alshaaer, Mazen | Brussels |
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Bih, L. |
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Casati, R. |
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Muller, Hermance |
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Kočí, Jan | Prague |
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Šuljagić, Marija |
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Kalteremidou, Kalliopi-Artemi | Brussels |
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Azam, Siraj |
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Ospanova, Alyiya |
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Blanpain, Bart |
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Ali, M. A. |
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Popa, V. |
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Rančić, M. |
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Ollier, Nadège |
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Azevedo, Nuno Monteiro |
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Landes, Michael |
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Rignanese, Gian-Marco |
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Lähnemann, Jonas
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (11/11 displayed)
- 2022Molecular beam epitaxy of single-crystalline bixbyite (In<SUB>1<SUB>−x</SUB>Ga<SUB>x</SUB> ) 2</SUB>O<SUB>3</SUB> films (x ≤0.18 ): Structural properties and consequences of compositional inhomogeneitycitations
- 2021Bandgap widening and behavior of Raman-active phonon modes of cubic single-crystalline (In,Ga)<SUB>2</SUB>O<SUB>3</SUB> alloy filmscitations
- 2020Beam damage of single semiconductor nanowires during X-ray nano beam diffraction experimentscitations
- 2020Plasma-assisted molecular beam epitaxy of NiO on GaN(00.1)citations
- 2014Luminescence associated with stacking faults in GaNcitations
- 2014Stacking faults as quantum wells in nanowires: Density of states, oscillator strength, and radiative efficiencycitations
- 2013Spatially resolved investigation of strain and composition variations in (In,Ga)N/GaN epilayerscitations
- 2012Optical switching and related structural properties of epitaxial Ge<SUB>2</SUB>Sb<SUB>2</SUB>Te<SUB>5</SUB> filmscitations
- 2012Direct experimental determination of the spontaneous polarization of GaNcitations
- 2011Self-assisted nucleation and vapor-solid growth of InAs nanowires on bare Si (111)citations
- 2010GaN and ZnO nanostructurescitations
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article
Self-assisted nucleation and vapor-solid growth of InAs nanowires on bare Si (111)
Abstract
The nucleation and growth of InAs nanowires on bare Si(111) has been investigated by molecular beam epitaxy. Nontapered InAs nanowires with high aspect ratio were grown perpendicular to the substrate without the use of catalyst particles, surface oxide, or other substrate mask. The nucleation of InAs takes place in In-rich areas forming spontaneously on the substrate in the beginning of the growth process. As the nucleation proceeds, the local stoichiometry on the growth interface changes from In-rich to As-rich, and the growth continues in a vapor-solid mode. This transition to As-rich conditions is correlated with the evolution of nanowire morphology, that is, with the growth becoming strictly uniaxial and with well-defined vertical sidewalls forming. The diameter, the number density, and the axial growth rate of the nanowires were found to depend exclusively on the surface diffusivity of In adatoms on the substrate....