| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Ludwigs, Sabine
University of Stuttgart
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (9/9 displayed)
- 2023Autonomous Adaption of Intelligent Humidity‐Programmed Hydrogel Patches for Tunable Stiffness and Drug Releasecitations
- 2020Hybrid spintronic materials from conducting polymers with molecular quantum bits
- 2019From Isotropic to Anisotropic Conductivities in P(NDI2OD-T2) by (Electro-)Chemical Doping Strategiescitations
- 2019Triphenylamine and some of its derivatives as versatile building blocks for organic electronic applicationscitations
- 2016Achieving 6.7% Efficiency in P3HT/Indene‐C70 Bisadduct Solar Cells through the Control of Vertical Volume Fraction Distribution and Optimized Regio‐Isomer Ratioscitations
- 2014High-Temperature Rubbing: A Versatile Method to Align π-Conjugated Polymers without Alignment Substratecitations
- 2011In situ electrochemical monitoring of selective etching in ordered mesoporous block-copolymer templatescitations
- 2010Soft-etch mesoporous hole-conducting block copolymer templatescitations
- 2010Control of gyroid forming block copolymer templatescitations
Places of action
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article
In situ electrochemical monitoring of selective etching in ordered mesoporous block-copolymer templates
Abstract
<p>We present a simple in situ electrochemical probe for the selective etching of the PLA component of thin film poly(4-fluorostyrene)-b-poly(D,L-lactide) (PFS-b-PLA) mesoporous block copolymer templates with a range of highly ordered microphase morphologies. Etching rates between 0.6 and 0.9 nm s <sup>-1</sup> were measured in electric-field aligned standing PLA cylinders 12 nm wide and up to 800 nm long. The etching rate within a bicontinuous gyroid network morphology is comparable to that of the hexagonally ordered cylindrical array. A microphase-separated, nonaligned but film-spanning PLA pore structure is found in cylinder forming PFS-b-PLA films immediately after spin coating that could have applications in patterning of functional nanostructured arrays. Cross-film percolation of the PLA phase is confirmed electrochemically, with an etching rate approximately half that of the highly ordered morphologies. The etching rate is independent of template thickness in all three morphologies.</p>