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Naji, M. |
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Motta, Antonella |
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Aletan, Dirar |
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Mohamed, Tarek |
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Ertürk, Emre |
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Taccardi, Nicola |
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Kononenko, Denys |
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Petrov, R. H. | Madrid |
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Alshaaer, Mazen | Brussels |
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Bih, L. |
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Casati, R. |
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Muller, Hermance |
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Kočí, Jan | Prague |
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Šuljagić, Marija |
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Kalteremidou, Kalliopi-Artemi | Brussels |
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Azam, Siraj |
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Ospanova, Alyiya |
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Blanpain, Bart |
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Ali, M. A. |
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Popa, V. |
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Rančić, M. |
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Ollier, Nadège |
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Azevedo, Nuno Monteiro |
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Landes, Michael |
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Rignanese, Gian-Marco |
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Lyu, Xin
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Publications (3/3 displayed)
- 2023Influence of crumbed rubber inclusion on spalling, microstructure, and mechanical behaviour of UHPC exposed to elevated temperaturescitations
- 2023Residual strength of steel fibre reinforced rubberised UHPC under elevated temperaturescitations
- 2022Organic Monolayers on Si(211) for Triboelectricity Generationcitations
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article
Organic Monolayers on Si(211) for Triboelectricity Generation
Abstract
<p>Triboelectric nanogenerators (TENGs) based on sliding silicon-organic monolayer-metal Schottky diodes are an emerging autonomous direct-current (DC) current supply technology. Herein, using conductive atomic force microscopy and electrochemical techniques, we explore the optimal etching conditions toward the preparation of DC TENGs on Si(211), a readily available, highly conductive, and underexplored silicon crystallographic cut. We report optimized conditions for the chemical etching of Si(211) surfaces with subnanometer root-mean-square roughness, explore Si(211) chemical passivation, and unveil a relationship between the electrochemical charge-transfer behavior at the silicon-liquid interface and the zero-applied bias current output from the corresponding dynamic silicon-organic monolayer-platinum system. The overall aim is to optimize the etching and functionalization of the relatively underexplored Si(211) facet, toward its application in out-of-equilibrium Schottky diodes as autonomous power supplies. We also propose the electrochemical behavior of surface-confined redox couples as a diagnostic tool to anticipate whether or not a given surface will perform satisfactorily when used in a TENG design.</p>