Materials Map

Discover the materials research landscape. Find experts, partners, networks.

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The Materials Map is an open tool for improving networking and interdisciplinary exchange within materials research. It enables cross-database search for cooperation and network partners and discovering of the research landscape.

The dashboard provides detailed information about the selected scientist, e.g. publications. The dashboard can be filtered and shows the relationship to co-authors in different diagrams. In addition, a link is provided to find contact information.

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The Materials Map is still under development. In its current state, it is only based on one single data source and, thus, incomplete and contains duplicates. We are working on incorporating new open data sources like ORCID to improve the quality and the timeliness of our data. We will update Materials Map as soon as possible and kindly ask for your patience.

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in Cooperation with on an Cooperation-Score of 37%

Topics

Publications (3/3 displayed)

  • 2023Thermal transport in metal-NbOx-metal cross-point devices and its effect on threshold switching characteristics3citations
  • 2023Effect of Interdiffusion and Crystallization on Threshold Switching Characteristics of Nb/Nb2O5/Pt Memristors3citations
  • 2020Electric Field- And Current-Induced Electroforming Modes in NbO x 39citations

Places of action

Chart of shared publication
Das, Sujan Kumar
2 / 3 shared
Nandi, Sanjoy
3 / 7 shared
Liang, Yan
1 / 2 shared
Mcculloch, Dougal G.
1 / 9 shared
Ratcliff, Thomas
2 / 3 shared
Murdoch, Billy J.
1 / 9 shared
Li, Shuai
1 / 2 shared
Raad, Peter E.
1 / 1 shared
El-Helou, Assaad E.
1 / 1 shared
Uenuma, Mutsunori
1 / 3 shared
Chart of publication period
2023
2020

Co-Authors (by relevance)

  • Das, Sujan Kumar
  • Nandi, Sanjoy
  • Liang, Yan
  • Mcculloch, Dougal G.
  • Ratcliff, Thomas
  • Murdoch, Billy J.
  • Li, Shuai
  • Raad, Peter E.
  • El-Helou, Assaad E.
  • Uenuma, Mutsunori
OrganizationsLocationPeople

article

Effect of Interdiffusion and Crystallization on Threshold Switching Characteristics of Nb/Nb2O5/Pt Memristors

  • Mcculloch, Dougal G.
  • Ratcliff, Thomas
  • Das, Sujan Kumar
  • Nandi, Sanjoy
  • Nath, Shimul Kanti
  • Murdoch, Billy J.
Abstract

<p>The resistive switching response of two terminal metal/oxide/metal devices depends on the stoichiometry of the oxide film, and this is commonly controlled by using a reactive metal electrode to reduce the oxide layer. Here, we investigate compositional and structural changes induced in Nb/Nb<sub>2</sub>O<sub>5</sub> bilayers by thermal annealing at temperatures in the range of 573-973 K and its effect on the volatile threshold switching characteristics of Nb/Nb<sub>2</sub>O<sub>5</sub>/Pt devices. Changes in the stoichiometry of the Nb and Nb<sub>2</sub>O<sub>5</sub> films are determined by Rutherford backscattering spectrometry and energy-dispersive X-ray (EDX) mapping of sample cross sections, while the structure of the films is determined by X-ray diffraction, Raman spectroscopy, and transmission electron microscopy (TEM). Such analysis shows that the composition of the Nb and Nb<sub>2</sub>O<sub>5</sub> layers is homogenized by interdiffusion at temperatures less than the crystallization temperature (i.e., &gt;773 K) but that this effectively ceases once the films crystallize. This is explained by comparison with the predictions of a simple diffusion model which shows that the compositional changes are dominated by oxygen diffusion in the amorphous oxide, which is much faster than that in the crystalline phases. We further show that these compositional and structural changes have a significant effect on the electroforming and threshold switching characteristics of the devices, the most significant being a marked increase in their reliability and endurance after crystallization of the oxide films. Finally, we examine the effect of annealing on the quasistatic negative differential resistance characteristics and oscillator dynamics of devices and use a lumped element model to show that this is dominated by changes in the device capacitance resulting from interdiffusion.</p>

Topics
  • impedance spectroscopy
  • amorphous
  • x-ray diffraction
  • Oxygen
  • crystalline phase
  • reactive
  • laser emission spectroscopy
  • transmission electron microscopy
  • annealing
  • Energy-dispersive X-ray spectroscopy
  • Raman spectroscopy
  • crystallization
  • spectrometry
  • Rutherford backscattering spectrometry
  • interdiffusion
  • crystallization temperature