Materials Map

Discover the materials research landscape. Find experts, partners, networks.

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The Materials Map is an open tool for improving networking and interdisciplinary exchange within materials research. It enables cross-database search for cooperation and network partners and discovering of the research landscape.

The dashboard provides detailed information about the selected scientist, e.g. publications. The dashboard can be filtered and shows the relationship to co-authors in different diagrams. In addition, a link is provided to find contact information.

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The Materials Map is still under development. In its current state, it is only based on one single data source and, thus, incomplete and contains duplicates. We are working on incorporating new open data sources like ORCID to improve the quality and the timeliness of our data. We will update Materials Map as soon as possible and kindly ask for your patience.

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in Cooperation with on an Cooperation-Score of 37%

Topics

Publications (1/1 displayed)

  • 2020Spatial Control of the Self-assembled Block Copolymer Domain Orientation and Alignment on Photopatterned Surfaces8citations

Places of action

Chart of shared publication
Cheng, Joy Y.
1 / 1 shared
Blachut, Gregory
1 / 7 shared
Asano, Yusuke
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Kline, R. Joseph
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Lynd, Nathaniel A.
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Maher, Michael J.
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Sanders, Daniel P.
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Bates, Christopher M.
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Carlson, Matthew C.
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Willson, C. Grant
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Callan, Devon H.
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Rettner, Charles T.
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Liu, Philip
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Kim, Ji Yeon
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Chart of publication period
2020

Co-Authors (by relevance)

  • Cheng, Joy Y.
  • Blachut, Gregory
  • Asano, Yusuke
  • Kline, R. Joseph
  • Lynd, Nathaniel A.
  • Maher, Michael J.
  • Sanders, Daniel P.
  • Bates, Christopher M.
  • Sunday, Daniel F.
  • Carlson, Matthew C.
  • Willson, C. Grant
  • Callan, Devon H.
  • Rettner, Charles T.
  • Liu, Philip
  • Kim, Ji Yeon
OrganizationsLocationPeople

article

Spatial Control of the Self-assembled Block Copolymer Domain Orientation and Alignment on Photopatterned Surfaces

  • Cheng, Joy Y.
  • Blachut, Gregory
  • Asano, Yusuke
  • Kline, R. Joseph
  • Lynd, Nathaniel A.
  • Maher, Michael J.
  • Sanders, Daniel P.
  • Bates, Christopher M.
  • Sunday, Daniel F.
  • Carlson, Matthew C.
  • Willson, C. Grant
  • Callan, Devon H.
  • Rettner, Charles T.
  • Liu, Philip
  • Baiz, Carlos R.
  • Kim, Ji Yeon
Abstract

<p>Polarity-switching photopatternable guidelines can be directly used to both orient and direct the self-assembly of block copolymers. We report the orientation and alignment of poly(styrene-block-4-trimethylsilylstyrene) (PS-b-PTMSS) with a domain periodicity, L<sub>0</sub>, of 44 nm on thin photopatternable grafting surface treatments (pGSTs) and cross-linkable surface treatments (pXSTs), containing acid-labile 4-tert-butoxystyrene monomer units. The surface treatment was exposed using electron beam lithography to create well-defined linear arrays of neutral and preferential regions. Directed self-assembly (DSA) of PS-b-PTMSS with much lower defectivity was observed on pXST than on pGST guidelines. The study of the effect of film thickness on photoacid diffusion by Fourier transform infrared spectroscopy and near-edge X-ray absorption fine structure spectroscopy suggested slower diffusion in thinner films, potentially enabling production of guidelines with sharper interfaces between the unexposed and exposed lines, and thus, the DSA of PS-b-PTMSS on thinner pXST guidelines resulted in better alignment control.</p>

Topics
  • surface
  • copolymer
  • block copolymer
  • Fourier transform infrared spectroscopy
  • self-assembly
  • lithography
  • near-edge X-ray absorption fine structure spectroscopy