| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Maher, Michael J.
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (12/12 displayed)
- 2022Toughening Polylactide with Graft-Block Polymerscitations
- 2020Spatial Control of the Self-assembled Block Copolymer Domain Orientation and Alignment on Photopatterned Surfacescitations
- 2020Unusual Thermal Properties of Certain Poly(3,5-disubstituted styrene)scitations
- 2020Grain Growth and Coarsening Dynamics in a Compositionally Asymmetric Block Copolymer Revealed by X-ray Photon Correlation Spectroscopycitations
- 2019Physical Aging of Polylactide-Based Graft Block Polymerscitations
- 2018Dynamics of a Supercooled Disordered Sphere-Forming Diblock Copolymer as Determined by X-ray Photon Correlation and Dynamic Mechanical Spectroscopiescitations
- 2017Directed Self-Assembly and Pattern Transfer of Five Nanometer Block Copolymer Lamellaecitations
- 2016A Hybrid Chemo-/Grapho-Epitaxial Alignment Strategy for Defect Reduction in Sub-10 nm Directed Self-Assembly of Silicon-Containing Block Copolymerscitations
- 2016Orthogonally Spin-Coated Bilayer Films for Photochemical Immobilization and Patterning of Sub-10-Nanometer Polymer Monolayerscitations
- 2016Pattern Transfer of Sub-10 nm Features via Tin-Containing Block Copolymerscitations
- 2016Synthesis and characterization of Si-containing block co-polymers with resolution beyond 10 nmcitations
- 2015Modulating Solubility and Enhancing Reactivity of Photo-Cross-Linkable Poly(styrene sulfonyl azide-alt-maleic anhydride) Thin Filmscitations
Places of action
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article
Modulating Solubility and Enhancing Reactivity of Photo-Cross-Linkable Poly(styrene sulfonyl azide-alt-maleic anhydride) Thin Films
Abstract
<p>To formalize our understanding of indiscriminate grafting chemistries as they pertain to cross-linkable polymers and emerging patterning technologies, we designed a new polymer, poly(styrene sulfonyl azide-alt-maleic anhydride) (PSSMA). By modulating its solubility, it can be deposited into smooth, ultrathin films atop polar and nonpolar polymers. Upon heating above 120 °C or exposure to UV light, highly reactive nitrene intermediates are generated from the azide groups which form covalent adducts and cross-link the PSSMA. Azide photolysis and polymer gelation were studied in the context of a statistical model to gain insight into the network outcomes of nitrenes in a polymer film. For every azide group converted to a nitrene in ambient atmosphere, it has an 11% likelihood of grafting to another chain and a 5% chance of causing a scission. These values can be increased over 3-fold by reducing the O<sub>2</sub> content by 85%. Alternatively, the effects of quenching by ground-state O<sub>2</sub> can be mitigated by adding Michler's ketone (MK) to the film. PSSMA/MK blend films possess a 39% (±13) likelihood for grafting and 29% (±10) for scission. The higher ratio of scission to grafting is a consequence of the sensitized azides producing triplet-state nitrenes, which favor hydrogen abstraction. These broadly generalizable considerations will be useful to others who wish to maximize light sensitivity in related polymer systems.</p>