• Hadziioannou, Georges
• Shi, Yulin
• Pino, Guillaume
• Demazy, Nils
• Fleury, Guillaume
• Mantione, Daniele
• Cummins, Cian
• Cruciani, Federico
• Portale, Giuseppe, A.

Abstract

<p>We leverage the attractive properties of a high χ-low N BCP, i.e., poly(styrene)-block-poly(2-fluoroethylmethyl acrylate) (PS-b-P2FEMA), and illustrate its utility for next-generation nanomanufacturing. The synthesis, physical characterization, and thin film self-assembly of a series of lamellar and cylindrical PS-b-P2FEMA BCPs are delineated. PS-b-P2FEMA BCPs with total molecular weights ranging from 7 to 22 kg mol-1 were synthesized by using reversible addition-fragmentation chain-transfer (RAFT) polymerization. Temperature-resolved small-angle X-ray scattering (SAXS) measurements revealed a large χ value (0.13 at 150 °C) for PS-b-P2FEMA. Solvothermal vapor annealing of PS-b-P2FEMA films produced highly oriented fingerprint patterns in as short as 60 s. Lamellar period sizes ranged from 25.9 down to 14.2 nm with feature sizes as small as 7 nm observed. We also demonstrate the integration feasibility of PS-b-P2FEMA BCPs through alumina hardmask formation using sequential infiltration synthesis. The highly favorable characteristics of the P2FEMA-based BCPs detailed here provide a versatile material option to the current library of available BCPs for sub-10 nm nanolithography. </p>

Topics

• thin film
• annealing
• molecular weight
• copolymer
• block copolymer
• small angle x-ray scattering
• self-assembly