| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Cea, Pilar
Institut National de l'Audiovisuel
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (9/9 displayed)
- 2024Fabrication of palladium-enriched metallic structures by direct focused He + and Ne + beam nanowriting from organometallic thin films: a comparison with Ga + and e - beamscitations
- 2024Gas-Phase Synthesis of Iron Silicide Nanostructures Using a Single-Source Precursorcitations
- 2022Low-resistivity Pd nanopatterns created by a direct electron beam irradiation process free of post-treatment stepscitations
- 2022Low-resistivity Pd nanopatterns created by a direct electron beam irradiation process free of post-treatment stepscitations
- 2022High-throughput direct writing of metallic micro- and nano-structures by focused Ga+beam irradiation of palladium acetate filmscitations
- 2021Highly-efficient growth of cobalt nanostructures using focused ion beam induced deposition under cryogenic conditions: application to electrical contacts on graphene, magnetism and hard maskingcitations
- 2021Highly-efficient growth of cobalt nanostructures using focused ion beam induced deposition under cryogenic conditions : application to electrical contacts on graphene, magnetism and hard maskingcitations
- 2021Uncapped gold nanoparticles for the metallization of organic monolayerscitations
- 2017All-carbon electrode molecular electronic devices based on Langmuir–Blodgett monolayerscitations
Places of action
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article
Gas-Phase Synthesis of Iron Silicide Nanostructures Using a Single-Source Precursor
Abstract
<p>The investigation of precursor classes for the fabrication of nanostructures is of specific interest for maskless fabrication and direct nanoprinting. In this study, the differences in material composition depending on the employed process are illustrated for focused-ion-beam- and focused-electron-beam-induced deposition (FIBID/FEBID) and compared to the thermal decomposition in chemical vapor deposition (CVD). This article reports on specific differences in the deposit composition and microstructure when the (H<sub>3</sub>Si)<sub>2</sub>Fe(CO)<sub>4</sub> precursor is converted into an inorganic material. Maximum metal/metalloid contents of up to 90 at. % are obtained in FIBID deposits and higher than 90 at. % in CVD films, while FEBID with the same precursor provides material containing less than 45 at. % total metal/metalloid content. Moreover, the Fe:Si ratio is retained well in FEBID and CVD processes, but FIBID using Ga<sup>+</sup> ions liberates more than 50% of the initial Si provided by the precursor. This suggests that precursors for FIBID processes targeting binary materials should include multiple bonding such as bridging positions for nonmetals. In addition, an in situ method for investigations of supporting thermal effects of precursor fragmentation during the direct-writing processes is presented, and the applicability of the precursor for nanoscale 3D FEBID writing is demonstrated.</p>