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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Saari, Jesse
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (16/16 displayed)
- 2024Ti3+ Self-Doping-Mediated Optimization of TiO2 Photocatalyst Coating Grown by Atomic Layer Depositioncitations
- 2023Is Carrier Mobility a Limiting Factor for Charge Transfer in Tio2/Si Devices? A Study by Transient Reflectance Spectroscopycitations
- 2022Insights into Tailoring of Atomic Layer Deposition Grown TiO2 as Photoelectrode Coating
- 2022Low-Temperature Route to Direct Amorphous to Rutile Crystallization of TiO2Thin Films Grown by Atomic Layer Depositioncitations
- 2022Tunable Ti3+-Mediated Charge Carrier Dynamics of Atomic Layer Deposition-Grown Amorphous TiO2citations
- 2021Interface Engineering of TiO2 Photoelectrode Coatings Grown by Atomic Layer Deposition on Siliconcitations
- 2020Optimization of photogenerated charge carrier lifetimes in ald grown tio2 for photonic applicationscitations
- 2019Defect engineering of atomic layer deposited TiO2 for photocatalytic applications
- 2019Diversity of TiO2: Controlling the molecular and electronic structure of atomic layer deposited black TiO2citations
- 2018Fabrication of topographically microstructured titanium silicide interface for advanced photonic applicationscitations
- 2018Role of Oxide Defects in ALD grown TiO2 Coatings on Performance as Photoanode Protection Layer
- 2018Improved Stability of Atomic Layer Deposited Amorphous TiO2 Photoelectrode Coatings by Thermally Induced Oxygen Defectscitations
- 2017Role of Oxide Defects in ALD grown TiO2 Coatings on Performance as Photoanode Protection Layer
- 2017Tailored Fabrication of Transferable and Hollow Weblike Titanium Dioxide Structurescitations
- 2017Tailored Fabrication of Transferable and Hollow Weblike Titanium Dioxide Structurescitations
- 2016Fabrication of topographically microstructured titanium silicide interface for advanced photonic applicationscitations
Places of action
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article
Tunable Ti3+-Mediated Charge Carrier Dynamics of Atomic Layer Deposition-Grown Amorphous TiO2
Abstract
Amorphous titania (am.-TiO2) has gained wide interest in the field of photocatalysis, thanks to exceptional disorder-mediated optical and electrical properties compared to crystalline TiO2. Here, we study the effects of intrinsic Ti3+ and nitrogen defects in am.-TiO2 thin films via the atomic layer deposition (ALD) chemistry of tetrakis(dimethylamido)titanium(IV) (TDMAT) and H2O precursors at growth temperatures of 100–200 °C. X-ray photoelectron spectroscopy (XPS) and computational analysis allow us to identify structural disorder-induced penta- and heptacoordinated Ti4+ ions (Ti5/7c4+), which are related to the formation of Ti3+ defects in am.-TiO2. The Ti3+-rich ALD-grown am.-TiO2 has stoichiometric composition, which is explained by the formation of interstitial peroxo species with oxygen vacancies. The occupation of Ti3+ 3d in-gap states increases with the ALD growth temperature, inducing both visible-light absorption and electrical conductivity via the polaron hopping mechanism. At 200 °C, the in-gap states become fully occupied extending the lifetime of photoexcited charge carriers from the picosecond to the nanosecond time domain. Nitrogen traces from the TDMAT precursor had no effect on optical properties and only little on charge transfer properties. These results provide insights into the charge transfer properties of ALD-grown am.-TiO2 that are essential to the performance of protective photoelectrode coatings in photoelectrochemical solar fuel reactors. ; Peer reviewed