People | Locations | Statistics |
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Naji, M. |
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Motta, Antonella |
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Aletan, Dirar |
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Mohamed, Tarek |
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Ertürk, Emre |
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Taccardi, Nicola |
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Kononenko, Denys |
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Petrov, R. H. | Madrid |
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Alshaaer, Mazen | Brussels |
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Bih, L. |
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Casati, R. |
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Muller, Hermance |
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Kočí, Jan | Prague |
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Šuljagić, Marija |
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Kalteremidou, Kalliopi-Artemi | Brussels |
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Azam, Siraj |
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Ospanova, Alyiya |
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Blanpain, Bart |
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Ali, M. A. |
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Popa, V. |
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Rančić, M. |
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Ollier, Nadège |
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Azevedo, Nuno Monteiro |
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Landes, Michael |
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Rignanese, Gian-Marco |
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Detavernier, Christophe
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (72/72 displayed)
- 2024Elucidating the Non-Covalent Interactions that Trigger Interdigitation in Lead-Halide Layered Hybrid Perovskites.citations
- 2024Elucidating the non-covalent interactions that trigger interdigitation in lead-halide layered hybrid perovskitescitations
- 2024Atomic layer deposition for tuning the surface chemical composition of nickel iron phosphates for oxygen evolution reaction in alkaline electrolyzerscitations
- 2024Design and synthesis of novel p-type TCOs: From computational screening towards film deposition
- 2024Controlling Pt nanoparticle sintering by sub-monolayer MgO ALD thin filmscitations
- 2024Al3Sc thin films for advanced interconnect applicationscitations
- 2024Oxygen-Mediated (0D) Cs4PbX6 Formation during Open-Air Thermal Processing Improves Inorganic Perovskite Solar Cell Performancecitations
- 2024Oxygen-Mediated (0D) Cs4PbX6 Formation during Open-Air Thermal Processing Improves Inorganic Perovskite Solar Cell Performancecitations
- 2024Optimization of Non-Alloyed Backside Ohmic Contacts to N-Face GaN for Fully Vertical GaN-on-Silicon-Based Power Devicescitations
- 2023Effects of post metallization annealing on Al2O3 atomic layer deposition on n-GaNcitations
- 2023Atomic layer deposition of yttrium oxide as a protective coating for lithium metal anodes
- 2023Crystalline tin disulfide by low-temperature plasma-enhanced 2 atomic layer deposition as an electrode material for Li-ion batteries 3 and CO2 electroreductioncitations
- 2023Effects of post metallization annealing on Al<sub>2</sub>O<sub>3</sub> atomic layer deposition on n-GaNcitations
- 2023Low temperature area selective atomic layer deposition of ruthenium dioxide thin films using polymers as inhibition layerscitations
- 2023Low temperature area selective atomic layer deposition of ruthenium dioxide thin films using polymers as inhibition layerscitations
- 2023High temperature H2S removal via CO2-assisted chemical looping over ZrO2-modified Fe2O3citations
- 2023Plasma-enhanced atomic layer deposition of crystalline Ga2S3 thin filmscitations
- 2023Plasma-enhanced atomic layer deposition of crystalline Ga2S3 thin filmscitations
- 2022Effects of post metallization annealing on Al2O3 atomic layer deposition on n-GaN
- 2022Properties of ultrathin molybdenum films for interconnect applicationscitations
- 2022Titanium carboxylate molecular layer deposited hybrid films as protective coatings for lithium-ion batteriescitations
- 2022Atomic layer deposition of ternary ruthenates by combining metalorganic precursors with RuO4 as the co-reactantcitations
- 2022Shuffling Atomic Layer Deposition Gas Sequences to Modulate Bimetallic Thin Films and Nanoparticle Propertiescitations
- 2022Shuffling atomic layer deposition gas sequences to modulate bimetallic thin films and nanoparticle propertiescitations
- 2022Atomic layer deposition of ruthenium dioxide based on redox reactions between alcohols and ruthenium tetroxidecitations
- 2022An in situ photoluminescence study of atomic layer deposition on polymer embedded InP-based quantum dots
- 2022Atomic layer deposition of metal phosphatescitations
- 2022Plasma-enhanced atomic layer deposition of nickel and cobalt phosphate for lithium ion batteriescitations
- 2021Influence of Alumina Addition on the Optical Properties and the Thermal Stability of Titania Thin Films and Inverse Opals Produced by Atomic Layer Deposition
- 2021In situ study of noble metal atomic layer deposition processes using grazing incidence small angle X-ray scattering
- 2021Microstructured ZrO2 coating of iron oxide for enhanced CO2 conversioncitations
- 2021Atomic layer deposition on polymer thin films : on the role of precursor infiltration and reactivitycitations
- 2021Tuning of the thermal stability and ovonic threshold switching properties of GeSe with metallic and non-metallic alloying elementscitations
- 2021Impact of changes in bond structure on ovonic threshold switching behaviour in GeSe2citations
- 2021Covalent graphite modification by low-temperature photocatalytic oxidation using a titanium dioxide thin film prepared by atomic layer depositioncitations
- 2021Emergence of Metallic Conductivity in Ordered One-Dimensional Coordination Polymer Thin Films upon Reductive Dopingcitations
- 2020Hierarchical Fe-modified MgAl2O4 as Ni-catalyst support for methane dry reformingcitations
- 2020FeO controls the sintering of iron-based oxygen carriers in chemical looping CO2 conversioncitations
- 2020Thermal and plasma-enhanced atomic layer deposition of yttrium oxide films and the properties of water wettabilitycitations
- 2019Pressure-induced deactivation of core-shell nanomaterials for catalyst assisted chemical loopingcitations
- 2019Atomic layer deposition of thin films as model electrodes : a case study of the synergistic effect in Fe2O3-SnO2citations
- 2019Fe2O3-MgAl2O4 for CO production from CO2 : Mössbauer spectroscopy and in situ X-ray diffractioncitations
- 2018Kinetics of Lifetime Changes in Bimetallic Nanocatalysts Revealed by Quick X-ray Absorption Spectroscopycitations
- 2018Voltage-controlled ON−OFF ferromagnetism at room temperature in a single metal oxide filmcitations
- 2018ALD-developed plasmonic two-dimensional Au-WO3-TiO2 heterojunction architectonics for design of photovoltaic devicescitations
- 2018PdZn nanoparticle catalyst formation for ethanol dehydrogenation : active metal impregnation vs incorporationcitations
- 2018Effect of Annealing Ferroelectric HfO₂ Thin Films: In Situ, High Temperature X-Ray Diffractioncitations
- 2018Voltage-controlled ON-OFF ferromagnetism at room temperature in a single metal oxide filmcitations
- 2017Controlling the stability of a Fe-Ni reforming catalyst : structural organization of the active componentscitations
- 2017Plasma-enhanced atomic layer deposition of silver using Ag(fod)(<tex>$PEt_{3}$</tex>) and <tex>$NH_{3}$</tex>-plasmacitations
- 2017Sensing the framework state and guest molecules in MIL-53(Al) via the electron paramagnetic resonance spectrum of V-IV dopant ionscitations
- 2017Axiotaxy in oxide heterostructures: Preferential orientation of BaCeO3 nanoparticles embedded in superconducting YBa2Cu3O7 −δ thin filmscitations
- 2017Size- and composition-controlled Pt–Sn bimetallic nanoparticles prepared by atomic layer depositioncitations
- 2016Atomic layer deposition route to tailor nanoalloys of noble and non-noble metalscitations
- 2016Chemically Triggered Formation of Two-Dimensional Epitaxial Quantum Dot Superlatticescitations
- 2016Chemically Triggered Formation of Two-Dimensional Epitaxial Quantum Dot Superlatticescitations
- 2016Novel method for conformal LiMn2O4 thin films fabrication on planar and 3D microstructure substrates
- 2016Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealingcitations
- 2016Deactivation study of Fe2O3−CeO2 during redox cycles for CO production from CO2citations
- 2016Kinetics of multi-step redox processes by time-resolved In situ X-ray diffractioncitations
- 2015Atomic layer deposited second-order nonlinear optical metamaterial for back-end integration with CMOS-compatible nanophotonic circuitrycitations
- 2014Photocatalytic acetaldehyde oxidation in air using spacious TiO2 films prepared by atomic layer deposition on supported carbonaceous sacrificial templates
- 2014Synchrotron based in situ characterization during atomic layer deposition
- 2014Transparent conducting oxide films of group V doped titania prepared by aqueous chemical solution depositioncitations
- 2014Delivering a modifying element to metal nanoparticles via support: Pt-Ga alloying during the reduction of Pt/Mg(Al,Ga)Ox catalysts and its effects on propane dehydrogenationcitations
- 2013Optimization of WAl2O3Cu(-Te) material stack for high-performance conductive-bridging memory cellscitations
- 2013Combining optical and electrical studies to unravel the effect of Sb doping on CIGS solar cell
- 2012Texture effects in solid-state reactions of thin filmscitations
- 2012In Situ Monitoring of Atomic Layer Deposition in Nanoporous Thin Films Using Ellipsometric Porosimetrycitations
- 2011Tailoring nanoporous materials by atomic layer depositioncitations
- 2011Spacious and mechanically flexible mesoporous silica thin film composed of an open network of interlinked nanoslabscitations
- 2009Crystallization resistance of barium titanate zirconate ultrathin films from aqueous CSD: a study of cause and effectcitations
Places of action
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article
Plasma-enhanced atomic layer deposition of silver using Ag(fod)(<tex>$PEt_{3}$</tex>) and <tex>$NH_{3}$</tex>-plasma
Abstract
A plasma-enhanced atomic layer deposition (ALD) process using the Ag(fod)(PEt3) precursor [(triethylphosphine)(6,6,7,7,8,8,8-heptafluoro-2,2-dimethy1-3,5-octanedionate)silver(I)] in combination with NH3-plasma is reported. The steady growth rate of the reported process (0.24 +/- 0.03 nm/cycle) was found to be 6 times larger than that of the previously reported Ag ALD process based on the same precursor in combination with H-2-plasma (0.04 +/- 0.02 nm/cycle). The ALD characteristics of the H-2-plasma and NH3-plasma processes were verified. The deposited Ag films were polycrystalline face-centered cubic Ag for both processes. The film morphology was investigated by ex situ scanning electron microscopy and grazing-incidence small-angle X-ray scattering, and it was found that films grown with the NH3-plasma process exhibit a much higher particle areal density and smaller particle sizes on oxide substrates compared to those deposited using the H-2-plasma process. This control over morphology of the deposited Ag is important for applications in catalysis and plasmonics. While films grown with the H-2-plasma process had oxygen impurities (similar to 9 atom %) in the bulk, the main impurity for the NH3-plasma process was nitrogen (similar to 7 atom %). In situ Fourier transform infrared spectroscopy experiments suggest that these nitrogen impurities are derived from NH surface groups generated during the NH3-plasma, which interact with the precursor molecules during the precursor pulse. We propose that the reaction of these surface groups with the precursor leads to additional deposition of Ag atoms during the precursor pulse compared to the H-2-plasma process, which explains the enhanced growth rate of the NH3-plasma process.