693.932 PEOPLE
| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Marcoen, Kristof
Vrije Universiteit Brussel
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (33/33 displayed)
- 2024Molecular Layer Deposition of Zeolitic Imidazolate Framework-8 Filmscitations
- 2024Application of operando ORP-EIS for the in-situ monitoring of acid anion incorporation during anodizingcitations
- 2024Effect of heat treatment on the microstructure and pitting corrosion behavior of 316L stainless steel fabricated by different additive manufacturing methods (L-PBF versus L-DED): Comparative investigation exploring the role of microstructural features on passivitycitations
- 2023Revealing the Role of Electrolyte Salt Decomposition in the Structural Breakdown of LiNi0.5Mn1.5O4citations
- 2023Identification of carbon‐containing phases in electrodeposited hard Fe–C coatings with intentionally codeposited carbon
- 2023Molecular Layer Deposition of Zeolitic Imidazolate Framework-8 Filmscitations
- 2023Molecular Layer Deposition of Zeolitic Imidazolate Framework-8 Filmscitations
- 2023Molecular Layer Deposition of Zeolitic Imidazolate Framework-8 Filmscitations
- 2023Identification of carbon-containing phases in electrodeposited hard Fe–C coatings with intentionally codeposited carbon
- 2023Investigation of hybrid Zr-aminosilane treatment formation on zinc substrate and comparison to advanced high strength stainless steelcitations
- 2022Electrochemical codeposition of copper-antimony and interactions with electrolyte additives: towards the use of electronic waste for sustainable copper electrometallurgycitations
- 2022Unraveling the mechanism of the conversion treatment on Advanced High Strength Stainless Steels (AHSSS)citations
- 2022Electrochemical codeposition of arsenic from acidic copper sulfate baths : the implications for sustainable copper electrometallurgycitations
- 2022Unraveling the formation mechanism of hybrid Zr conversion coating on advanced high strength stainless steelscitations
- 2021A study of the interfacial chemistry between polymeric methylene diphenyl di-isocyanate and a Fe-Cr alloycitations
- 2021Electrochemical codeposition of arsenic from acidic copper sulfate baths: the implications for sustainable copper electrometallurgycitations
- 2021Effect of Sr Addition to a Modified AA3003 on Microstructural and Corrosion Propertiescitations
- 2021Effect of Sr Addition to a Modified AA3003 on Microstructural and Corrosion Propertiescitations
- 2020Molecular Characterization of Bonding Interactions at the Buried Steel Oxide-Aminopropyl Triethoxysilane Interface Accessed by Ar Cluster Sputteringcitations
- 2020ToF-SIMS characterization of the interfacial molecular chemistry in metal (active) corrosion protection systems based on organic coatings
- 2020Effect of excess hydrogen bond donors on the electrode-electrolyte interface between choline chloride-ethylene glycol based solvents and coppecitations
- 2020Integrated cleanroom process for the vapor-phase deposition of large-area zeolitic imidazolate framework thin filmscitations
- 2020Molecular Characterization of Multiple Bonding Interactions at the Steel Oxide - Aminopropyl triethoxysilane Interface by ToF-SIMScitations
- 2020Molecular Characterization of Multiple Bonding Interactions at the Steel Oxide-Aminopropyl triethoxysilane Interface by ToF-SIMScitations
- 2019Electrode-electrolyte interactions in choline chloride ethylene glycol based solvents and their effect on the electrodeposition of ironcitations
- 2019Dual Role of Lithium on the Structure and Self-Healing Ability of PMMA-Silica Coatings on AA7075 Alloycitations
- 2019The chemical throwing power of lithium-based inhibitors from organic coatings on AA2024-T3citations
- 2019Integrated Cleanroom Process for the Vapor-Phase Deposition of Large-Area Zeolitic Imidazolate Framework Thin Filmscitations
- 2019An integrated cleanroom process for the vapor-phase deposition of large-area zeolitic imidazolate framework thin filmscitations
- 2018Compositional study of a corrosion protective layer formed by leachable lithium salts in a coating defect on AA2024-T3 aluminium alloyscitations
- 2018Fluoride-Induced Interfacial Adhesion Loss of Nanoporous Anodic Aluminium Oxide Templates in Aerospace Structurescitations
- 2017Unravelling the chemical influence of water on the PMMA/aluminum oxide hybrid interface in situcitations
- 2017Atomic Layer Deposition of Ruthenium Thin Films from (Ethylbenzyl)(1-Ethyl-1,4-cyclohexadienyl) Ru: Process Characteristics, Surface Chemistry, and Film Propertiescitations
Places of action
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article
Atomic Layer Deposition of Ruthenium Thin Films from (Ethylbenzyl)(1-Ethyl-1,4-cyclohexadienyl) Ru: Process Characteristics, Surface Chemistry, and Film Properties
Abstract
The process characteristics, the surface chemistry, and the resulting film properties of Ru deposited by atomic layer deposition from (ethylbenzyl)(1-ethyl-1,4-cyclohexadienyl)Ru(0) (EBECHRu) and O2 are discussed. The surface chemistry was characterized by both combustion reactions as well as EBECHRu surface reactions by ligand release. The process behavior on TiN starting surfaces at 325 °C was strongly influenced by Ti(O,N)x segregation on the growing Ru surface with consequences for both the growth per cycle as well as the film properties. For optimized process conditions, the films showed high purity with low C and O concentrations of the order of 1020 at./cm3. Higher deposition temperature led to strong (001) fiber texture of the films on SiO2 starting surfaces. Annealing in forming gas improved the crystallinity and led to resistivity values as low as 11 μΩcm for Ru films with a thickness of 10 nm.