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Naji, M. |
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Motta, Antonella |
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Aletan, Dirar |
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Mohamed, Tarek |
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Ertürk, Emre |
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Taccardi, Nicola |
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Kononenko, Denys |
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Petrov, R. H. | Madrid |
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Alshaaer, Mazen | Brussels |
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Bih, L. |
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Casati, R. |
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Muller, Hermance |
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Kočí, Jan | Prague |
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Šuljagić, Marija |
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Kalteremidou, Kalliopi-Artemi | Brussels |
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Azam, Siraj |
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Ospanova, Alyiya |
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Blanpain, Bart |
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Ali, M. A. |
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Popa, V. |
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Rančić, M. |
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Ollier, Nadège |
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Azevedo, Nuno Monteiro |
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Landes, Michael |
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Rignanese, Gian-Marco |
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Savjani, Nicky
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Publications (6/6 displayed)
- 2023Tribology of Copper Metal Matrix Composites Reinforced with Fluorinated Graphene Oxide Nanosheets: Implications for Solid Lubricants in Mechanical Switchescitations
- 2023A Hybrid Graphene-Reinforced Copper Matrix/Multilayer Composite Coating System for High-Load Solid Lubrication
- 2017A Single Source Precursor for Tungsten Dichalcogenide Thin Films: Mo1-xWxS2 (0 ≤ x ≤ 1) Alloys by Aerosol-Assisted Chemical Vapor Deposition (AACVD)citations
- 2016Asymmetric MoS2-graphene-metal sandwiches: Preparation, characterization and applicationcitations
- 2016Asymmetric MoS2-graphene-metal sandwiches: Preparation, characterization and applicationcitations
- 2015Synthesis of Lateral Size-Controlled Monolayer 1H-MoS2@Oleylamine as Supercapacitor Electrodes.citations
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article
A Single Source Precursor for Tungsten Dichalcogenide Thin Films: Mo1-xWxS2 (0 ≤ x ≤ 1) Alloys by Aerosol-Assisted Chemical Vapor Deposition (AACVD)
Abstract
The coordination complex WS<sub>3</sub>L<sub>2</sub> (where L = S<sub>2</sub>CN(CH<sup>2</sup>CH<sub>3</sub>)<sub>2</sub> ) can be used to deposit tungsten disulfide (WS<sub>2</sub>) thin films by aerosol-assisted chemical vapour deposition (AACVD). When WS<sub>3</sub>L<sub>2</sub> is used in conjunction with the previ-ously reported precursor, MoL<sub>4</sub> which produces molybdenum disulfide (MoS<sub>2</sub>) by AACVD, alloyed thin films of the type Mo<sub>1-x</sub>W<sub>x</sub>S<sub>2</sub> are produced. The W/Mo ratio can be controlled by chang-ing the relative concentrations of precursors in the carrier aerosol, allowing straightforward manipulation of the optical properties of the material and exquisite control of the final film composition.