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Naji, M. |
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Motta, Antonella |
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Aletan, Dirar |
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Mohamed, Tarek |
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Ertürk, Emre |
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Taccardi, Nicola |
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Kononenko, Denys |
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Petrov, R. H. | Madrid |
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Alshaaer, Mazen | Brussels |
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Bih, L. |
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Casati, R. |
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Muller, Hermance |
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Kočí, Jan | Prague |
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Šuljagić, Marija |
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Kalteremidou, Kalliopi-Artemi | Brussels |
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Azam, Siraj |
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Ospanova, Alyiya |
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Blanpain, Bart |
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Ali, M. A. |
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Popa, V. |
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Rančić, M. |
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Ollier, Nadège |
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Azevedo, Nuno Monteiro |
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Landes, Michael |
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Rignanese, Gian-Marco |
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Tu, Min
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Topics
Publications (6/6 displayed)
- 2023Vapor-assisted synthesis of the MOF-74 metal–organic framework family from zinc, cobalt, and magnesium oxidescitations
- 2023Molecular Layer Deposition of Zeolitic Imidazolate Framework-8 Filmscitations
- 2023Molecular Layer Deposition of Zeolitic Imidazolate Framework-8 Filmscitations
- 2023Molecular Layer Deposition of Zeolitic Imidazolate Framework-8 Filmscitations
- 2020Solvent-Free Powder Synthesis and MOF-CVD Thin Films of the Large-Pore Metal-Organic Framework MAF-6citations
- 2014Self-Directed Localization of ZIF-8 Thin Film Formation by Conversion of ZnO Nanolayerscitations
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article
Molecular Layer Deposition of Zeolitic Imidazolate Framework-8 Films
Abstract
<p>Vapor-phase film deposition of metal-organic frameworks (MOFs) would facilitate the integration of these materials into electronic devices. We studied the vapor-phase layer-by-layer deposition of zeolitic imidazolate framework 8 (ZIF-8) by consecutive, self-saturating reactions of diethyl zinc, water, and 2-methylimidazole on a substrate. Two approaches were compared: (1) Direct ZIF-8 “molecular layer deposition” (MLD), which enables a nanometer-resolution thickness control and employs only self-saturating reactions, resulting in smooth films that are crystalline as-deposited, and (2) two-step ZIF-8 MLD, in which crystallization occurs during a postdeposition treatment with additional linker vapor. The latter approach resulted in a reduced deposition time and an improved MOF quality, i.e., increased crystallinity and probe molecule uptake, although the smoothness and thickness control were partially lost. Both approaches were developed in a modified atomic layer deposition reactor to ensure cleanroom compatibility.</p>