| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Decams, Jean-Manuel
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (7/7 displayed)
- 2024Determining by Raman spectroscopy the average thickness and N -layer-specific surface coverages of MoS 2 thin films with domains much smaller than the laser spot sizecitations
- 2024Optimizing YSZ Electrolyte Deposition via MOCVD for Enhanced Thin Film Solid Oxide Cells ; Optimisation de la déposition d'electrolyte de YSZ par MOCVD pour des cellules à oxydes solides en couche mince performantes
- 2024Integration of epitaxial LiNbO3 thin films with silicon technologycitations
- 2024Ni(111) Substrate Engineering for the Epitaxial Chemical Vapor Deposition Growth of Wrinkle-Free Multilayer Rhombohedral Boron Nitride Filmscitations
- 2024Development of hydrogen-selective TiO x N y -Pd composite membrane materials by atomic layer depositioncitations
- 2024Direct liquid injection pulsed-pressure MOCVD of large area MoS 2 on Si/SiO 2citations
- 2001Synthesis and characterization of niobium(V) and tantalum(V) derivatives with diamido ligands. Moleular structure of {4.5-Me2-o-C6H2(NSiMe3)2}2NbCl and of a tantalum imidecitations
Places of action
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article
Synthesis and characterization of niobium(V) and tantalum(V) derivatives with diamido ligands. Moleular structure of {4.5-Me2-o-C6H2(NSiMe3)2}2NbCl and of a tantalum imide
Abstract
he reactions between lithium bis(trimethyl)phenylenediamide and niobium or tantalum pentachlorides at low temperature afforded [{4,5-Me2-C6H2(NSiMe3)2}2MCl] (M=Nb (1), Ta (2)) independently of the stoichiometry used, 1:1 or 2:1. The reaction between tantalum pentachloride and N,N′-bis(trimethylsilyl)-o-dimethylphenylene diamide o-C6H2Me2(NSiMe3)2 in Et2O–DME at −78 °C leads to a tantalum(V) imide 3. Monosubstitution with diamides was achieved on tantalum with the more rigid 1,8-diamido-naphtalene. The various compounds were characterized by elemental analysis, FT-IR and NMR. Compounds 1 and 3 were characterized also by single crystal X-ray diffraction. The metal is pentacoordinated for 1 bearing two bidentate o-phenylenediamide ligands and a chlorine in the apical position of a distorted square-tetragonal pyramid. The salient features are a disymmetrical coordination mode of the diamide ligand with two quite different Nb–N distances namely 1.981(2) and 2.053(3) A, as well as short Nb–C distances with the phenyl ring [2.495(3) and 2.471(3) A]. The diamide ligand is thus coordinated in a η4-fashion in the solid state. The salient feature of the structure of 3 is the presence in the metal coordination sphere of the functional imido ligand [Me2C6H2N(SiMe2Cl)(NSiMe3−xClx)]2− (x=1 or 0) which was generated by N–Si bond cleavage and Si–Me/Si–Cl scrambling. Tantalum is six-coordinate, linked to the bulky imido ligand, three chlorine and a bidentate dimethoxyethane. The surrounding of the metal is distorted with a TaN bond distance of 1.706(5) A and a large Ta–N(2)–C(2) angle [170.7(5)°]. The thermal behavior as well as the reactivity as soluble α-olefin polymerization catalyst were evaluated for 1.