• Soo, Joshua Zheyan
• Narangari, Parvathala Reddy

Abstract

<p>Nanostructured III-V semiconductors are attractive for solar energy conversion applications owing to their excellent light harvesting and optoelectronic properties. Here, we present a protocol for scalable fabrication of III-V semiconductor nanopillars using a simple and cost-effective top-down approach, combining self-assembled random mask and plasma etching techniques. We describe the deposition of Au/SiO₂ layers to prepare random etch mask. We then detail the fabrication of nanopillars and photocathodes. Finally, we demonstrate III-V semiconductor nanopillars as a photoelectrode for photoelectrochemical water splitting. For complete details on the use and execution of this protocol, please refer to Narangari et al. (2021).¹</p>

Topics

• Deposition
• random
• III-V semiconductor
• plasma etching