| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Song, Shigeng
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (8/8 displayed)
- 2023Broadband infrared absorber based on a sputter deposited hydrogenated carbon multilayer enhancing MEMS-based CMOS thermopile performancecitations
- 2022High throughput low cost closed field magnetron sputter deposition of durable reflectors based on dielectric overcoated metal for application in non-dispersive infrared gas sensors
- 2022High throughput microwave plasma assisted sputter deposition of linear variable filters and deployment into visible and near infrared spectrometers
- 2020Durable infrared optical coatings based on pulsed DC-sputtering of hydrogenated amorphous carbon (a-C:H)citations
- 2018Optimised performance of non-dispersive infrared gas sensors using multilayer thin film bandpass filterscitations
- 2017Characterisation of Cu2O, Cu4O3, and CuO mixed phase thin films produced by microwave-activated reactive sputteringcitations
- 2016Nanostructured ZnO films prepared by hydro-thermal chemical deposition and microwave-activated reactive sputteringcitations
- 2015Investigation of structural, optical and micro-mechanical properties of (NdyTi1-y)O-x thin films deposited by magnetron sputteringcitations
Places of action
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article
Characterisation of Cu2O, Cu4O3, and CuO mixed phase thin films produced by microwave-activated reactive sputtering
Abstract
Copper readily forms three oxides, CuO, Cu<sub>4</sub>O<sub>3</sub> and Cu<sub>2</sub>O, widely recognised as the most promising p-type oxides because of their desirable optical and electrical properties and potential use in solar cells, transparent electronics as well as other specialised applications such as electrodes for rechargeable lithium batteries, catalysis and memristors. For large-scale implementation of devices, magnetron sputtering is a practical method of producing metal oxides; however, sputtered copper oxides tend to form as a mixture of the oxides, with Cu<sub>2</sub>O being particularly difficult to produce reliably in pure form. Here, nanostructured thin films of copper oxides were prepared by a variation on reactive sputtering known as microwave-activated reactive sputtering under various rates of oxygen flow. Microwave-activated reactive sputtering was shown to be a suitable technique for the inexpensive production of large areas of copper oxide thin films at near room temperature, facilitating deposition on a wide variety of substrates including polymers. Furthermore, it was demonstrated that the sputtered films develop through CuO, Cu<sub>4</sub>O<sub>3</sub> and Cu<sub>2</sub>O mixed phases as oxygen flow rate is increased. The preparation of a given stoichiometry for a particular application can be achieved by varying the flow rate of oxygen during the microwave-activated reactive sputtering process.