| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Vila-Comamala, Joan
Paul Scherrer Institute
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (8/8 displayed)
- 2023Directly observing atomic-scale relaxations of a glass forming liquid using femtosecond X-ray photon correlation spectroscopycitations
- 2021High sensitivity X-ray phase contrast imaging by laboratory grating-based interferometry at high Talbot order geometrycitations
- 2020Metal assisted chemical etching of silicon in the gas phase: a nanofabrication platform for X-ray opticscitations
- 2017Hot embossing of Au- and Pb-based alloys for x-ray grating fabricationcitations
- 2017Effect of isopropanol on gold assisted chemical etching of silicon microstructurescitations
- 2017High aspect ratio metal microcasting by hot embossing for X-ray optics fabricationcitations
- 2010Direct e-beam writing of high aspect ratio nanostructures in PMMA: A tool for diffractive X-ray optics fabricationcitations
- 2009Advanced thin film technology for ultrahigh resolution x-ray microscopycitations
Places of action
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article
Advanced thin film technology for ultrahigh resolution x-ray microscopy
Abstract
Further progress in the spatial resolution of X-ray microscopes is currently impaired by fundamental limitations in the production of X-ray diffractive lenses. Here, we demonstrate how advanced thin film technologies can be applied to boost the fabrication and characterization of ultrahigh resolution X-ray optics. Specifically, Fresnel zone plates were fabricated by combining electron-beam lithography with atomic layer deposition and focused ion beam induced deposition. They were tested in a scanning transmission X-ray microscope at 1.2 keV photon energy using line pair structures of a sample prepared by metalorganic vapor phase epitaxy. For the first time in X-ray microscopy, features below 10nm in width were resolved. (C) 2009 Elsevier B.V. All rights reserved.