| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Chodun, Rafał
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (14/14 displayed)
- 2021Synthesis of Copper Nitride Layers by the Pulsed Magnetron Sputtering Method Carried out under Various Operating Conditionscitations
- 2021The Microstructure and Properties of Carbon Thin Films on Nanobainitic Steelcitations
- 2020Design of pulsed neon injection in the synthesis of W-B-C films using magnetron sputtering from a surface-sintered single powder cathodecitations
- 2020Surface sintering of tungsten powder targets designed by electromagnetic discharge: A novel approach for film synthesis in magnetron sputteringcitations
- 2019Plasmochemical investigations of DLC/WCx nanocomposite coatings synthesized by gas injection magnetron sputtering techniquecitations
- 2019Influence of annealing on electronic properties of thin AlN films deposited by magnetron sputtering method on silicon substratescitations
- 2018Relation between modulation frequency of electric power oscillation during pulse magnetron sputtering deposition of MoNx thin filmscitations
- 2018Phase composition of copper nitride coatings examined by the use of X-ray diffraction and Raman spectroscopycitations
- 2018Structure and electrical resistivity dependence of molybdenum thin films deposited by dc modulated pulsed magnetron sputteringcitations
- 2017Reactive sputtering of titanium compounds using the magnetron system with a grounded cathodecitations
- 2017Multi-sided metallization of textile fibres by using magnetron system with grounded cathodecitations
- 2016Determination of sp 3 fraction in ta-C coating using XPS and Raman spectroscopy
- 2016Titanium nitride coatings synthesized by IPD method with eliminated current oscillationscitations
- 2010Structure of Fe-Cu coatings prepared by the magnetron sputtering method
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article
Design of pulsed neon injection in the synthesis of W-B-C films using magnetron sputtering from a surface-sintered single powder cathode
Abstract
The surface sintering approach was examined in the present manuscript to obtain single cathode material consisting of multiple elements. Design of electromagnetic discharge without the use of a mechanical press was utilized for this purpose at pulsed pressure oscillations, ranging from 25 to 125 Pa. Meanwhile, each pulsed plasma flux provided absolute energy varying from 87.8 to 279.5 J, resulting in a well-sintered tungsten boride crust within carbon matrix (WBx-C). Its application in sense of sintering degree was estimated by measuring thermal diffusivity, with a maximum value of 3.65 mm2/s achieved at the mid-range neon injection (75–100 Pa). Further, as-surface-sintered cathode material provided suitable contribution to the promising deposition rate (54 nm/min) of W-B-C films by employing gas injection magnetron sputtering in the single magnetron cycle. The quantitative analysis examined using photoelectron X-ray spectroscopy showed that W-B-C films are composed of four elements, of which the W/B ratio was differed prior to prepared cathode materials stoichiometry. The chemical bonding state study revealed the C-W, B-W, B-C and B-O bonds, of which W2BC nanocrystallites (~ 2 nm) were formed in the amorphous structure under the arrangement of neon pulsed glow discharge, and as indicated results of fast Fourier transform and Raman spectra. Nucleation of those ternary nanoclusters promoted a Vickers microhardness result of 26.3 GPa, emphasizing a sensitive response to the mechanical performance of deposited W-B-C films.