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Naji, M. |
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Motta, Antonella |
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Aletan, Dirar |
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Mohamed, Tarek |
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Ertürk, Emre |
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Taccardi, Nicola |
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Kononenko, Denys |
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Petrov, R. H. | Madrid |
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Alshaaer, Mazen | Brussels |
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Bih, L. |
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Casati, R. |
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Muller, Hermance |
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Kočí, Jan | Prague |
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Šuljagić, Marija |
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Kalteremidou, Kalliopi-Artemi | Brussels |
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Azam, Siraj |
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Ospanova, Alyiya |
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Blanpain, Bart |
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Ali, M. A. |
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Popa, V. |
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Rančić, M. |
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Ollier, Nadège |
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Azevedo, Nuno Monteiro |
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Landes, Michael |
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Rignanese, Gian-Marco |
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Gibson, Desmond
University of the West of Scotland
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (23/23 displayed)
- 2024Giant piezoelectric effect induced by porosity in inclined ZnO thin filmscitations
- 2024Optical and structural properties of silicon nitride thin films deposited by plasma enhanced chemical vapor deposition for high reflectance optical mirrors
- 2024Non-stoichiometric silicon nitride for future gravitational wave detectorscitations
- 2023Broadband infrared absorber based on a sputter deposited hydrogenated carbon multilayer enhancing MEMS-based CMOS thermopile performancecitations
- 2022High throughput low cost closed field magnetron sputter deposition of durable reflectors based on dielectric overcoated metal for application in non-dispersive infrared gas sensors
- 2022High throughput microwave plasma assisted sputter deposition of linear variable filters and deployment into visible and near infrared spectrometers
- 2021Glancing angle deposition of nanostructured ZnO films for ultrasonicscitations
- 2020Effect of physical activation/surface functional groups on wettability and electrochemical performance of carbon/activated carbon aerogels based electrode materials for electrochemical capacitorscitations
- 2020Durable infrared optical coatings based on pulsed DC-sputtering of hydrogenated amorphous carbon (a-C:H)citations
- 2019Effect of nitrogen doping on the electrochemical performance of resorcinol-formaldehyde based carbon aerogels as electrode material for supercapacitor applicationscitations
- 2018FORMATION OF PIEZOELECTRIC DEVICES
- 2017Influence of europium on structure modification of TiO2 thin films prepared by high energy magnetron sputtering processcitations
- 2017Modification of various properties of HfO2 thin films obtained by changing magnetron sputtering conditionscitations
- 2017Investigation of the antimicrobial properties of modified multilayer diamond-like carbon coatings on 316 stainless steel surface and coatings technologycitations
- 2017Characterisation of Cu2O, Cu4O3, and CuO mixed phase thin films produced by microwave-activated reactive sputteringcitations
- 2017Characterisation of Cu2O/CuO thin films produced by plasma-assisted DC sputtering for solar cell applicationcitations
- 2016Investigation of various properties of HfO2-TiO2 thin film composites deposited by multi-magnetron sputtering systemcitations
- 2016Nanostructured ZnO films prepared by hydro-thermal chemical deposition and microwave-activated reactive sputteringcitations
- 2015Investigation of structural, optical and micro-mechanical properties of (NdyTi1-y)O-x thin films deposited by magnetron sputteringcitations
- 2015The Effect of Growth Conditions on the Surface Energy, Optical Properties and Saline Corrosion Resistance of Amorphous Chromium Oxide Thin Films Prepared by Reactive Magnetron Sputtering
- 2011Large-aperture plasma-assisted deposition of inertial confinement fusion laser coatingscitations
- 2010Large-aperture plasma-assisted deposition of ICF laser coatings
- 2010High ion current density plasma source for ion-assisted deposition of optical thin filmscitations
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article
Characterisation of Cu2O/CuO thin films produced by plasma-assisted DC sputtering for solar cell application
Abstract
For large-scale implementation of devices magnetron sputtering is a practical method of producing metal oxides, however sputtered copper oxides tend to form as a mixture of Cu<sub>2</sub>O, Cu<sub>4</sub>O<sub>3</sub>, and CuO, with Cu2O being particularly difficult to produce reliably in pure form. In this study, nanostructured thin films of Cu<sub>2</sub>O, Cu<sub>4</sub>O<sub>3</sub>, and CuO were prepared using a novel reactive sputtering system, based on plasma-assisted DC magnetron sputtering with deposition and plasma assisted reaction zones spatially separated enabling separate control of film oxidation. X-ray diffraction, optical spectroscopy, and Raman spectroscopy were used to characterise the physical and optical properties and it is shown that plasma-assisted DC sputtering is a suitable technique for reliable production of CuO and Cu<sub>2</sub>O films in large areas at room temperature without the necessity of further processing. The results also indicate that solar cell performance may relate positively to the presence of crystalline Cu<sub>4</sub>O<sub>3</sub> (200) and/or Cu<sub>2</sub>O (111) over other crystalline forms of copper oxide or amorphous copper oxide thin films.