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| Naji, M. |
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Kukli, Kaupo
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Topics
Publications (35/35 displayed)
- 2024Threshold Switching and Resistive Switching in SnO2-HfO2 Laminated Ultrathin Filmscitations
- 2023Coatings Made by Atomic Layer Deposition for the Protection of Materials from Atomic Oxygen in Space
- 2022Structure and Electrical Behavior of Hafnium-Praseodymium Oxide Thin Films Grown by Atomic Layer Depositioncitations
- 2022Bipolar Resistive Switching in Hafnium Oxide-Based Nanostructures with and without Nickel Nanoparticlescitations
- 2022Memory Effects in Nanolaminates of Hafnium and Iron Oxide Films Structured by Atomic Layer Depositioncitations
- 2022Structure and electrical behavior of hafnium-praseodymium oxide thin films Grown by atomic layer depositioncitations
- 2021Optical and mechanical properties of nanolaminates of zirconium and hafnium oxides grown by atomic layer depositioncitations
- 2020Magnetic properties and resistive switching in mixture films and nanolaminates consisting of iron and silicon oxides grown by atomic layer depositioncitations
- 2020Atomic Layer Deposition and Performance of ZrO2-Al2O3 Thin Filmscitations
- 2020Behavior of nanocomposite consisting of manganese ferrite particles and atomic layer deposited bismuth oxide chloride filmcitations
- 2019Magnetic and Electrical Performance of Atomic Layer Deposited Iron Erbium Oxide Thin Filmscitations
- 2018Properties of Atomic Layer Deposited Nanolaminates of Zirconium and Cobalt Oxidescitations
- 2018Atomic Layer Deposition of Zirconium Dioxide from Zirconium Tetraiodide and Ozonecitations
- 2018Atomic Layer Deposition and Performance of ZrO2-Al2O3 Thin Filmscitations
- 2018Atomic Layer Deposition and Properties of HfO2-Al2O3 Nanolaminatescitations
- 2018Atomic layer deposition and properties of ZrO2/Fe2O3 thin filmscitations
- 2017Luminescence properties of $mathrm{Er^{3+}}$ doped zirconia thin films and $mathrm{ZrO_2/Er_2O_3}$ nanolaminates grown by atomic layer depositioncitations
- 2016Atomic layer deposition of aluminum oxide on modified steel substratescitations
- 2016Bismuth iron oxide thin films using atomic layer deposition of alternating bismuth oxide and iron oxide layerscitations
- 2015Atomic layer deposition of zirconium dioxide from zirconium tetrachloride and ozonecitations
- 2015Mechanical properties of aluminum, zirconium, hafnium and tantalum oxides and their nanolaminates grown by atomic layer depositioncitations
- 2014Atomic layer deposition of Zr<scp>O</scp><sub>2</sub> for graphene‐based multilayer structures: <i>In situ</i> and <i>ex situ</i> characterization of growth processcitations
- 2014Modification of Hematite Electronic Properties with Trimethyl Aluminum to Enhance the Efficiency of Photoelectrodescitations
- 2014Holmium and titanium oxide nanolaminates by atomic layer depositioncitations
- 2012Optical and Dielectric Characterization of Atomic Layer Deposited Nb2O5 Thin Filmscitations
- 2011Crystal structures and thermal properties of some rare earth alkoxides with tertiary alcoholscitations
- 2010High temperature atomic layer deposition of Ruthenium from N,N-dimethyl-1-ruthenocenylethylaminecitations
- 2010Atomic layer deposition and characterization of zirconium oxide-erbium oxide nanolaminatescitations
- 2009Electrical properties of thin zirconium and hafnium oxide high-k gate dielectrics grown by atomic layer deposition from cyclopentadienyl and ozone precursorscitations
- 2009Atomic layer deposition of high-k oxides of the group 4 metals for memory applicationscitations
- 2009Behavior of zirconium oxide films processed from novel monocyclopentadienyl precursors by atomic layer depositioncitations
- 2009Irradiation effect on dielectric properties of hafnium and gadolinium oxide gate dielectricscitations
- 2008Identification of spatial localization and energetic position of electrically active defects in amorphous high-k dielectrics for advanced devicescitations
- 2006Atomic layer deposition and properties of lanthanum oxide and lanthanum-aluminum oxide filmscitations
- 2005Atomic layer deposition of hafnium dioxide thin films from hafnium tetrakis(dimethylamide) and watercitations
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article
Bismuth iron oxide thin films using atomic layer deposition of alternating bismuth oxide and iron oxide layers
Abstract
<p>Bismuth iron oxide films with varying contributions from Fe2O3 or Bi2O3 were prepared using atomic layer deposition. Bismuth (III) 2,3-dimethyl-2-butoxide, was used as the bismuth source, iron(III) tert-butoxide as the iron source and water vapor as the oxygen source. The films were deposited as stacks of alternate Bi2O3 and Fe2O3 layers. Films grown at 140 degrees C to the thickness of 200-220 nm were amorphous, but crystallized upon post-deposition annealing at 500 degrees C in nitrogen. Annealing of films with intermittent bismuth and iron oxide layers grown to different thicknesses influenced their surface morphology, crystal structure, composition, electrical and magnetic properties. Implications of multiferroic performance were recognized in the films with the remanent charge polarization varying from 1 to 5 mu C/cm(2) and magnetic coercivity varying from a few up to 8000 A/m. (C) 2016 Elsevier B.V. All rights reserved.</p>