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Liu, Weiru
University of Bristol
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article
Characterisation of electrodeposited polycrystalline uranium dioxide thin films on nickel foil for industrial applications
Abstract
<p>Polycrystalline uranium dioxide thin films were grown on nickel substrates via aqueous electrodeposition of a precursor uranyl salt. The arising semiconducting uranium dioxide thin films exhibited a tower-like morphology, which may be suitable for future application in 3D solar cell applications. The thickness of the homogenous, tower-like films reached 350 nm. Longer deposition times led to the formation of thicker (up to 1.5 μm) and highly porous films.</p>