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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Gendre, Laurent Le
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Topics
Publications (14/14 displayed)
- 2021Perovskite (Sr<sub>2</sub>Ta<sub>2</sub>O<sub>7</sub>)<sub>100−x</sub>(La<sub>2</sub>Ti<sub>2</sub>O<sub>7</sub>)<sub>x</sub> ceramics: From dielectric characterization to dielectric resonator antenna applicationscitations
- 2017Deposition and dielectric study as function of thickness of perovskite oxynitride SrTaO<sub>2</sub>N thin films elaborated by reactive sputteringcitations
- 2017Ferroelectric and dielectric study of strontium tantalum based perovskite oxynitride films deposited by reactive rf magnetron sputteringcitations
- 2015Waste-glass recycling: A step toward microwave applicationscitations
- 2014Miniaturized notch antenna based on lanthanum titanium perovskite oxide thin filmscitations
- 2014Lanthanum titanium perovskite compound: Thin film deposition and high frequency dielectric characterizationcitations
- 2013Influence of the sputtering reactive gas on the oxide and oxynitride LaTiON deposition by RF magnetron sputteringcitations
- 2012Dielectric oxynitride LaTiO<sub>x</sub>N<sub>y</sub> thin films deposited by reactive radio-frequency sputteringcitations
- 2011Perovskite oxynitride LaTiOxNy thin films : Dielectric characterization in low and high frequenciescitations
- 2010Oxynitrides Perovskites Thin Films : Photoelectrochemical Measurement Under Visible Light
- 2009Photoelectrochemical Properties of Crystalline Perovskite Lanthanum Titanium Oxynitride Films under Visible Light.citations
- 2008Structural and dielectric properties of oxynitride perovskite LaTiOxNy thin filmscitations
- 2007Oxynitride perovskite LaTiO<sub>x</sub>N<sub>y</sub> thin films deposited by reactive sputteringcitations
- 2005Thermochemistry of a New Class of Materials Containing Dinitrogen Pairs in an Oxide Matrixcitations
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article
Lanthanum titanium perovskite compound: Thin film deposition and high frequency dielectric characterization
Abstract
Perovskite lanthanum titanium oxide thin films were deposited on (001) MgO, (001) LaAlO3 and Pt(111)/TiO2/SiO2/(001) Si substrates by RF magnetron sputtering, using a La2Ti2O7 homemade target sputtered under oxygen reactive plasma. The films deposited at 800 degrees C display a crystalline growth different than those reported on monoclinic ferroelectric La2Ti2O7 films. X-ray photoelectron spectroscopy analysis shows the presence of titanium as Ti4+ ions, with no trace of Ti3+, and provides a La/Ti ratio of 1.02. The depositions being performed from a La2Ti2O7 target under oxygen rich plasma, the same composition (La2Ti2O7) is proposed for the deposited films, with an unusual orthorhombic cell and Cmc2(1) space group. The films have a textured growth on MgO and Pt/Si substrates, and are epitaxially grown on LaAlO3 substrate. The dielectric characterization displays stable values of the dielectric constant and of the losses in the frequency range [0.1-20] GHz. No variation of the dielectric constant has been observed when a DC electric field up to 250 kV/cm was applied, which does not match a classical ferroelectric behavior at high frequencies and room temperature for the proposed La2Ti2O7 orthorhombic phase. At 10 GHz and room temperature, the dielectric constant of the obtained La2Ti2O7 films is epsilon similar to 60 and the losses are low (tan delta < 0.02)