| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Tamm, Aile
University of Tartu
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (17/17 displayed)
- 2024ZIF-8 derived iron-, sulphur-, and nitrogen-doped catalysts for anionexchange membrane fuel cell applicationcitations
- 2023Ag Sputter-Deposited on MnO2-Carbon Nanotube Nanocomposites as Electrocatalysts for Oxygen Reduction Reaction in Alkaline Mediacitations
- 2023Electrospun Carbon Nanofibre‐Based Catalysts Prepared with Co and Fe Phthalocyanine for Oxygen Reduction in Acidic Mediumcitations
- 2022Bipolar Resistive Switching in Hafnium Oxide-Based Nanostructures with and without Nickel Nanoparticlescitations
- 2022Memory Effects in Nanolaminates of Hafnium and Iron Oxide Films Structured by Atomic Layer Depositioncitations
- 2021Optical and mechanical properties of nanolaminates of zirconium and hafnium oxides grown by atomic layer depositioncitations
- 2020Behavior of nanocomposite consisting of manganese ferrite particles and atomic layer deposited bismuth oxide chloride filmcitations
- 2019Magnetic and Electrical Performance of Atomic Layer Deposited Iron Erbium Oxide Thin Filmscitations
- 2018Properties of Atomic Layer Deposited Nanolaminates of Zirconium and Cobalt Oxidescitations
- 2018Atomic layer deposition and properties of ZrO2/Fe2O3 thin filmscitations
- 2017Luminescence properties of $mathrm{Er^{3+}}$ doped zirconia thin films and $mathrm{ZrO_2/Er_2O_3}$ nanolaminates grown by atomic layer depositioncitations
- 2015Mechanical properties of aluminum, zirconium, hafnium and tantalum oxides and their nanolaminates grown by atomic layer depositioncitations
- 2014Atomic layer deposition of Zr<scp>O</scp><sub>2</sub> for graphene‐based multilayer structures: <i>In situ</i> and <i>ex situ</i> characterization of growth processcitations
- 2014Modification of Hematite Electronic Properties with Trimethyl Aluminum to Enhance the Efficiency of Photoelectrodescitations
- 2014Holmium and titanium oxide nanolaminates by atomic layer depositioncitations
- 2010Atomic layer deposition and characterization of zirconium oxide-erbium oxide nanolaminatescitations
- 2009Behavior of zirconium oxide films processed from novel monocyclopentadienyl precursors by atomic layer depositioncitations
Places of action
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article
Atomic layer deposition and characterization of zirconium oxide-erbium oxide nanolaminates
Abstract
ZrO2 and Er2O3 thin films and nanolaminates were grown by atomic layer deposition from tris(2,2,6,6-tetramethyl-3,5-heptanedionato)erbium, bis(methylcyclopentadienyl)methoxymethylzirconium and ozone as precursors at 350 °C. Nanolaminates consisted of 3-8 nm thick ZrO2 and Er2O3 layers alternately deposited on planar substrates and on three-dimensional substrates with aspect ratio 1:20. The erbium content was 5-15 at.%. ZrO2-Er2O3 films crystallized already in as-deposited states. Upon annealing at 650 °C, the films were stabilized in the form of cubic or tetragonal ZrO2 polymorph and cubic Er2O3. Dielectric properties of the nanolaminates were comparable to those of the constituent oxides.