| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Richard-Plouet, Mireille
French National Centre for Scientific Research
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (16/16 displayed)
- 2024Control of microstructure and composition of reactively sputtered vanadium nitride thin films based on hysteresis curves and application to microsupercapacitorscitations
- 2023Comprehensive study of WSiC:H coatings synthesized by microwave-assisted RF reactive sputteringcitations
- 2022Flow stress improvement of a nickel multicrystal by physical vapor thin film deposition to reduce surface effects
- 2022Kinetics driving nanocomposite thin-film deposition in low-pressure misty plasma processescitations
- 2021Hybrid approaches coupling sol–gel and plasma for the deposition of oxide-based nanocomposite thin films: a reviewcitations
- 2020Modification of the optical properties and nano-crystallinity of anatase TiO2nanoparticles thin film using low pressure O2 plasma treatmentcitations
- 2018Stress Gradient Determination in Anti-Corrosion Multilayer Coatingcitations
- 2018Stress Gradient Determination in Anti-Corrosion Multilayer Coatingcitations
- 2014Electrophoretic deposition of BaTiO3 thin films from stable colloidal aqueous solutionscitations
- 2013Anatase colloidal solutions suitable for inkjet printing: Enhancing lifetime of hybrid organic solar cellscitations
- 2012Deposition of nickel oxide by direct current reactive sputtering Effect of oxygen partial pressurecitations
- 2011Optical characterization of transparent nickel oxide films deposited by DC current reactive sputteringcitations
- 2006Magnetic structure and magnetic properties of synthetic lindgrenite, Cu-3(OH)(2)(MoO4)(2)citations
- 2006Comparison of lanthanum substituted bismuth titanate (BLT) thin films deposited by sputtering and pulsed laser depositioncitations
- 2006Nuclear and magnetic structures and magnetic properties of synthetic brochantite, Cu 4 (OH) 6 SO 4citations
- 2006Nuclear and magnetic structures and magnetic properties of the layered cobalt hydroxysulfate Co-5(OH)(6)(SO4)(2)(H2O)(4) and its deuterated analogue, Co-5(OD)(6)(SO4)(2)(D2O)citations
Places of action
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article
Comparison of lanthanum substituted bismuth titanate (BLT) thin films deposited by sputtering and pulsed laser deposition
Abstract
Bi4-xLaxTi3O12 (BLTx), (x =0 to 1) thin films were grown on silicon (100) and platinized substrates Pt/TiO2/SiO2/Si using RF diode sputtering, magnetron sputtering and pulsed laser deposition (PLD). Stoichiometric home-synthesized targets were used. Reactive sputtering was investigated in argon/oxygen gas mixture, with a pressure ranging from 0.33 to 10 Pa without heating the substrate. PLD was investigated in pure oxygen, at a chamber pressure of 20 Pa for a substrate temperature of 400–440 -C. Comparative structural, chemical, optical and morphological characterizations of BLT thin films have been performed by X-ray diffraction (XRD), Scanning Electron Microscopy (SEM), Energy Dispersive Spectroscopy (EDS), X-Ray Photoelectron Spectroscopy (XPS), Spectro-ellipsometric measurements (SE) and Atomic Force Microscopy (AFM). Both sputtering techniques allow to obtain uniform films with thickness ranging from 200 to 1000 nm and chemical composition varying from (Bi,La)2 Ti3 O12 to (Bi,La)4.5Ti3O12, depending on deposition pressure and RF power. In addition, BLT films deposited by magnetron sputtering, at a pressure deposition ranging from 1.1 to 5 Pa, were well-crystallized after a post-deposition annealing at 650 -C in oxygen. They exhibit a refractive index and optical band gap of 2.7 and 3.15 eV, respectively. Regarding PLD, single phase and well-crystallized, 100–200 nm thick BLT films with a stoichiometric (Bi,La)4Ti3O12 chemical composition were obtained, exhibiting in addition a preferential orientation along (200). It is worth noting that BLT films deposited by magnetron sputtering are as well-crystallized than PLD ones.