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Naji, M. |
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Motta, Antonella |
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Aletan, Dirar |
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Mohamed, Tarek |
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Ertürk, Emre |
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Taccardi, Nicola |
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Kononenko, Denys |
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Petrov, R. H. | Madrid |
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Alshaaer, Mazen | Brussels |
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Bih, L. |
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Casati, R. |
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Muller, Hermance |
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Kočí, Jan | Prague |
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Šuljagić, Marija |
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Kalteremidou, Kalliopi-Artemi | Brussels |
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Azam, Siraj |
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Ospanova, Alyiya |
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Blanpain, Bart |
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Ali, M. A. |
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Popa, V. |
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Rančić, M. |
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Ollier, Nadège |
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Azevedo, Nuno Monteiro |
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Landes, Michael |
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Rignanese, Gian-Marco |
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Vishnyakov, Vm
University of Huddersfield
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (30/30 displayed)
- 2022Reactively sintered TiB2-based heteromodulus UHT ceramics with in-situ formed graphene for machinable concentrated solar light absorberscitations
- 2022High Densification of Tungsten via Hot Pressing at 1300 °C in Carbon Presencecitations
- 2022Reaction Sintering of Biocompatible Al2O3-hBN Ceramicscitations
- 2022Reaction Sintering of Machinable TiB2-BN-C Ceramics with In-Situ Formed h-BN Nanostructurecitations
- 2021Integrated Nanomechanical Characterisation of Hard Coatingscitations
- 2021Thermal conductivity and thermal shock resistance of TiB2-based UHTCs enhanced by graphite plateletscitations
- 2021Corrosion performance and mechanical properties of FeCrSiNb amorphous equiatomic HEA thin filmcitations
- 2021Deviating from the pure MAX phase conceptcitations
- 2021Single-phase FeMnNiAl compositionally complex alloycitations
- 2020Demanding applications in harsh environment–FeCrMnNiC amorphous equiatomic alloy thin filmcitations
- 2020Reactive hot pressing route for dense ZrB2-SiC and ZrB2-SiC-CNT ultra-high temperature ceramicscitations
- 2020Effect of aluminium concentration on phase formation and radiation stability of Cr2Al x C thin filmcitations
- 2019Mechanisms of TiB2 and graphite nucleation during TiC–B4C high temperature interactioncitations
- 2019Reactive sintering of TiB2-SiC-CNT ceramicscitations
- 2018Synthesis and characterisation of high-entropy alloy thin films as candidates for coating nuclear fuel cladding alloyscitations
- 2018Use of ion-assisted sputtering technique for producing photocatalytic titanium dioxide thin filmscitations
- 2017Structure formation of TiB2-TiC-B4C-C hetero-modulus ceramics via reaction hot pressingcitations
- 2017Nano-scratch testing of (Ti,Fe)Nx thin films on siliconcitations
- 2017Fracture toughness in some hetero-modulus composite carbidescitations
- 2015Development of DLC coating architectures for demanding functional surface applications through nano- and micro-mechanical testingcitations
- 2015Interface Dynamics in Strained Polymer Nanocompositescitations
- 2013Ti3SiC2-formation during Ti-C-Si multilayer deposition by magnetron sputtering at 650°ccitations
- 2013Nanoscale Friction Measurements Up to 750 °Ccitations
- 2011Amorphous boron containing silicon carbo-nitrides created by ion sputteringcitations
- 2011Photocatalytic activity of reactively sputtered and directly sputtered titania coatingscitations
- 2010Physicomechanical properties of ultrahigh temperature heteromodulus ceramics based on group 4 transition metal carbidescitations
- 2010Comparison of Ti-Zr-V nonevaporable getter films deposited using alloy or twisted wire sputter-targetscitations
- 2006Single ion-induced amorphous zones in silicon
- 2006Influence of mechanical properties on the nanoscratch behaviour of hard nanocomposite TiN/Si3N4 coatings on Sicitations
- 2005Study of nanocrystalline TiN/Si3N4 thin films deposited using a dual ion beam methodcitations
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article
Study of nanocrystalline TiN/Si3N4 thin films deposited using a dual ion beam method
Abstract
<p>A dual ion beam system is used to produce hard nanocomposite TiN/Si <sub>3</sub>N<sub>4</sub> coatings on Si. Cross-sectional high resolution transmission electron microscopy analysis of the coatings shows that ion assistance causes microstructure to change from the non-assisted columnar form to one where there are small crystals present in an amorphous percolation network. For an unheated Si substrate, the microhardness increases with increasing ion-assist energy from 24 to 29 GPa, whereas for a deposition substrate at 400 °C, the microhardness values are 7-8 GPa or higher. The value of microhardness does not change even when coatings are annealed in vacuum at 1000 °C, showing that these coatings have high thermal stability. X-ray photoelectron spectroscopy data indicate that the -Ti-N-Si- bonds expected when the percolation network is formed are present only for substrate temperatures above 600 °C and that Ti-Si bonds form at lower temperature and during excess ion bombardment.</p>