| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Munnik, F.
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (13/13 displayed)
- 2024Defect Engineering of Ta3N5 Photoanodes: Enhancing Charge Transport and Photoconversion Efficiencies via Ti Dopingcitations
- 2019Design of high-temperature solar-selective coatings based on aluminium titanium oxynitrides AlyTi1-y(OxN1-x). Part 1: Advanced microstructural characterisation and optical simulationcitations
- 2011Iodine in alluvial platinum-palladium nuggets: evidence for biogenic precious-metal fixationcitations
- 2010Al1-xInxN/GaN bilayers: Structure, morphology, and optical propertiescitations
- 2010N-doped photocatalytic titania thin films on active polymer substratescitations
- 2009Deposition of functional coatings on polyethylene terephthalate films by magnetronplasma-enhanced chemical vapour depositioncitations
- 2009Room-temperature ferromagneticlike behavior in Mn-implanted and postannealed InAs layers deposited by molecular beam epitaxycitations
- 2008Deuterium influence on optical gap of amorphous carbon diamond-like carbon (DLC) thin filmcitations
- 2004Nanostructural and mechanical properties of nanocomposite nc -TiC/ a -C:H films deposited by reactive unbalanced magnetron sputteringcitations
- 2004DLC films on LiTaO3 for SAW devices
- 2004Optomechanical characterisation of compressively prestressed silicon oxynitride films deposited by plasma-enhanced chemical vapour deposition on silicon membranescitations
- 2004Optomechanical characterisation of compressively prestressed silicon oxynitride films deposited by plasma-enhanced chemical vapour deposition on silicon membranescitations
- 2004Nanostructural and mechanical properties of nanocomposite nc-TiC/a-C:H films deposited by reactive unbalanced magnetron sputteringcitations
Places of action
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article
Optomechanical characterisation of compressively prestressed silicon oxynitride films deposited by plasma-enhanced chemical vapour deposition on silicon membranes
Abstract
We have studied the composition and physical properties of silicon oxynitride (SiOxNy) films grown on silicon membranes by means of plasma-enhanced chemical vapour deposition (PECVD process). The influence of these properties on the mechanical behaviour of PECVD deposited films is investigated by an original “point-wise” deflection method. This technique, particularly appropriate for determining the residual stress in the case of prestressed membranes, is operating at the first order of buckling. It combines the classical interferometry with the nanoindentation technique. The interferometry measures the out-of-plane displacements of membranes with SiOxNy layers of different optical quality, while the nanoindentation permits the extraction of micromechanical properties such as hardness and Young's modulus. From the “point-wise” deflection technique, the distribution of residual stress was monitored as a function of the refractive index of SiOxNy films, establishing the correlation between the optical and micromechanical properties of deposited thin films. High measuring accuracy and resolution have been demonstrated, allowing the measurements to be used to enhance PECVD process control.