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Naji, M. |
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Motta, Antonella |
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Aletan, Dirar |
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Mohamed, Tarek |
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Ertürk, Emre |
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Taccardi, Nicola |
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Kononenko, Denys |
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Petrov, R. H. | Madrid |
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Alshaaer, Mazen | Brussels |
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Bih, L. |
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Casati, R. |
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Muller, Hermance |
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Kočí, Jan | Prague |
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Šuljagić, Marija |
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Kalteremidou, Kalliopi-Artemi | Brussels |
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Azam, Siraj |
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Ospanova, Alyiya |
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Blanpain, Bart |
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Ali, M. A. |
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Popa, V. |
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Rančić, M. |
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Ollier, Nadège |
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Azevedo, Nuno Monteiro |
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Landes, Michael |
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Rignanese, Gian-Marco |
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Zhu, Wenzhong
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Topics
Publications (10/10 displayed)
- 2017Modification of various properties of HfO2 thin films obtained by changing magnetron sputtering conditionscitations
- 2017Enhanced erosion performance of cold spray co-deposited AISI316 MMCs modified by friction stir processingcitations
- 2016Impact of heat exposure (fire damage) on the properties of sandstone
- 2015Investigation of structural, optical and micro-mechanical properties of (NdyTi1-y)O-x thin films deposited by magnetron sputteringcitations
- 2015Influence of interfacial transition zone on engineering properties of the concrete manufactured with recycled ceramic aggregatecitations
- 2015Ocean acidification alters the material properties of Mytilus edulis shellscitations
- 2014Influence of interfacial transition zone on engineering properties of the concrete manufactured with recycled ceramic aggregatecitations
- 2013Examples for nanotechnological applications in the energy sector
- 2012Correlation of Ca/Si and micromechanical properties in leached grey and white cement pastes
- 2011Mapping of mechanical properties of cement paste microstructures
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article
Modification of various properties of HfO2 thin films obtained by changing magnetron sputtering conditions
Abstract
In this work properties of hafnium dioxide (HfO<sub>2</sub>) thin films deposited by magnetron sputtering with different powers (i.e. 200 W, 400 W and 600 W) were described. Based on microstructure measurements obtained by X-ray diffraction, Raman scattering and transmission electron microscopy method it was observed that there is a significant influence of the sputtering power on investigated properties of HfO<sub style="">2</sub> thin films. Increase of the sputtering power caused, e.g. an increase of average crystallite size and surface roughness. Microstructure of thin films deposited with lower power was composed from a large number of voids that resulted in significant changes of their optical and mechanical properties. Results of optical studies showed that all deposited thin films were well transparent in a visible light range. Refractive index increased gradually with an increase of deposition power from 1.86 (200 W) to 2.09 (600 W). Performed investigations of mechanical properties revealed that hardness and Young’s elastic modulus of HfO<sub>2</sub> thin films increased with an increase of the sputtering power.