Materials Map

Discover the materials research landscape. Find experts, partners, networks.

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The Materials Map is an open tool for improving networking and interdisciplinary exchange within materials research. It enables cross-database search for cooperation and network partners and discovering of the research landscape.

The dashboard provides detailed information about the selected scientist, e.g. publications. The dashboard can be filtered and shows the relationship to co-authors in different diagrams. In addition, a link is provided to find contact information.

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The Materials Map is still under development. In its current state, it is only based on one single data source and, thus, incomplete and contains duplicates. We are working on incorporating new open data sources like ORCID to improve the quality and the timeliness of our data. We will update Materials Map as soon as possible and kindly ask for your patience.

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in Cooperation with on an Cooperation-Score of 37%

Topics

Publications (1/1 displayed)

  • 2007Growth rate, microstructure and conformality as a function of vapor exposure for zirconia thin films by pulsed-pressure MOCVD7citations

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Long, Nicholas
1 / 2 shared
Ramirez, Lynher
1 / 1 shared
Lebedev, Maxim
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2007

Co-Authors (by relevance)

  • Long, Nicholas
  • Ramirez, Lynher
  • Lebedev, Maxim
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article

Growth rate, microstructure and conformality as a function of vapor exposure for zirconia thin films by pulsed-pressure MOCVD

  • Long, Nicholas
  • Ramirez, Lynher
  • Kristinsdottir, Asdis
  • Lebedev, Maxim
Abstract

<p>Thin solid films of zirconia were deposited on solid and porous substrates over a range of deposition conditions by the pulsed-pressure metalorganic chemical vapor deposition (PP-MOCVD) process. The PP-MOCVD process uses timed injections of a liquid precursor solution through an ultrasonic atomizer into a continuously evacuated reactor. Process variables include solution injection volume, reactor volume, base pressure, peak pressure, and precursor concentration. Solid nickel, co-sintered nickel cermet and [100] P-type silicon were investigated as substrates for a range of deposition conditions. The exposure of the substrate to the precursor vapor was defined using a non-dimensional parameter combining the process parameters other than temperature. Deposits were examined by SEM and XRD. Results showed that PP-MOCVD produces a smooth, thin film that follows substrate contours. High exposure rate results in a higher growth rate, and a thicker film with columnar microstructure that bridges most pores in the porous nickel cermet substrates. The nickel cermet samples were prepared as electrode materials for solid oxide fuel cells (SOFC's). For the first time we demonstrate that arrival rate has a minimal effect on morphology and texture compared to deposition temperature.</p>

Topics
  • porous
  • microstructure
  • pore
  • nickel
  • scanning electron microscopy
  • x-ray diffraction
  • thin film
  • texture
  • Silicon
  • ultrasonic
  • chemical vapor deposition