Materials Map

Discover the materials research landscape. Find experts, partners, networks.

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The Materials Map is an open tool for improving networking and interdisciplinary exchange within materials research. It enables cross-database search for cooperation and network partners and discovering of the research landscape.

The dashboard provides detailed information about the selected scientist, e.g. publications. The dashboard can be filtered and shows the relationship to co-authors in different diagrams. In addition, a link is provided to find contact information.

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Materials Map under construction

The Materials Map is still under development. In its current state, it is only based on one single data source and, thus, incomplete and contains duplicates. We are working on incorporating new open data sources like ORCID to improve the quality and the timeliness of our data. We will update Materials Map as soon as possible and kindly ask for your patience.

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in Cooperation with on an Cooperation-Score of 37%

Topics

Publications (5/5 displayed)

  • 2006Method for precise extraction of optical functions from transmission electron energy loss spectroscopy1citations
  • 2006Dielectric properties of noncrystallineHfSiON39citations
  • 2006Dielectric Constant Behavior of Hf–O–N System31citations
  • 2005Determination of Band Alignment of Hafnium Silicon Oxynitride/Silicon (HfSiON/Si) Structures using Electron Spectroscopy31citations
  • 2004Influences of nonuniformity in metal concentration in gate dielectric silicate on CMIS inverters' propagation delay time3citations

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Chart of shared publication
Kamimuta, Y.
1 / 1 shared
Takeno, S.
1 / 1 shared
Koyama, M.
1 / 2 shared
Tanaka, Hiroki
1 / 1 shared
Tomita, M.
1 / 1 shared
Koike, M.
1 / 1 shared
Koike, Masahiro
2 / 2 shared
Nishiyama, Akira
4 / 4 shared
Mitani, Yuichiro
1 / 1 shared
Suzuki, Masamichi
3 / 3 shared
Kamata, Yoshiki
1 / 1 shared
Koyama, Masato
4 / 4 shared
Kamimuta, Yuuichi
3 / 3 shared
Tsunashima, Yoshitaka
1 / 1 shared
Takashima, Akira
1 / 1 shared
Ono, Mizuki
1 / 1 shared
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2006
2005
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Co-Authors (by relevance)

  • Kamimuta, Y.
  • Takeno, S.
  • Koyama, M.
  • Tanaka, Hiroki
  • Tomita, M.
  • Koike, M.
  • Koike, Masahiro
  • Nishiyama, Akira
  • Mitani, Yuichiro
  • Suzuki, Masamichi
  • Kamata, Yoshiki
  • Koyama, Masato
  • Kamimuta, Yuuichi
  • Tsunashima, Yoshitaka
  • Takashima, Akira
  • Ono, Mizuki
OrganizationsLocationPeople

article

Influences of nonuniformity in metal concentration in gate dielectric silicate on CMIS inverters' propagation delay time

  • Nishiyama, Akira
  • Koyama, Masato
  • Takashima, Akira
  • Ino, Tsunehiro
  • Ono, Mizuki
Abstract

It is shown that propagation delay time in CMIS (complementary metal insulator semiconductor field effect transistor) inverters is strongly affected by dielectric constant nonuniformity in gate dielectrics caused by the phase separation in silicate films. Influences of such nonuniformity on load capacitance are studied by analytical calculations based on a physical model which takes polarization into account. It is newly found that load capacitances are affected by the phase separation in qualitatively different ways, depending on the average metal concentration of their dielectric films. An experimental result is compared with those calculations. Influences of such nonuniformity on current drivability are studied by 3-dimensional device simulations. It is also newly found that such nonuniformity affects load capacitance and current drivability in different ways, resulting in an increase in propagation delay time of CMIS inverters for all metal concentrations studied. An explanation of this phenomenon is given with physical considerations.

Topics
  • impedance spectroscopy
  • phase
  • simulation
  • dielectric constant
  • semiconductor