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Naji, M. |
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Motta, Antonella |
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Aletan, Dirar |
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Mohamed, Tarek |
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Ertürk, Emre |
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Taccardi, Nicola |
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Kononenko, Denys |
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Petrov, R. H. | Madrid |
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Alshaaer, Mazen | Brussels |
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Bih, L. |
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Casati, R. |
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Muller, Hermance |
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Kočí, Jan | Prague |
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Šuljagić, Marija |
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Kalteremidou, Kalliopi-Artemi | Brussels |
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Azam, Siraj |
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Ospanova, Alyiya |
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Blanpain, Bart |
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Ali, M. A. |
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Popa, V. |
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Rančić, M. |
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Ollier, Nadège |
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Azevedo, Nuno Monteiro |
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Landes, Michael |
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Rignanese, Gian-Marco |
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Vehkamäki, Marko
University of Helsinki
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (41/41 displayed)
- 20243D-printed sensor electric circuits using atomic layer depositioncitations
- 2023Molecular layer deposition of hybrid silphenylene-based dielectric filmcitations
- 2023Atomic Layer Deposition of Boron-Doped Al2O3 Dielectric Filmscitations
- 2022Atomic layer deposition of GdF 3 thin filmscitations
- 2022Atomic layer deposition of GdF3 thin filmscitations
- 2022Atomic layer deposition of GdF3thin filmscitations
- 2022Atomic Layer Deposition of CsI and CsPbI3citations
- 2021Rhenium Metal and Rhenium Nitride Thin Films Grown by Atomic Layer Depositioncitations
- 2021Highly Material Selective and Self-Aligned Photo-assisted Atomic Layer Deposition of Copper on Oxide Materialscitations
- 2021Atomic Layer Deposition of Rhenium Disulfidecitations
- 2020Photoassisted atomic layer deposition of oxides employing alkoxides as single-source precursorscitations
- 2020Atomic Layer Deposition of PbS Thin Films at Low Temperaturescitations
- 2019As2S3 thin films deposited by atomic layer depositioncitations
- 2019Photoassisted atomic layer deposition of oxides employing alkoxides as single-source precursorscitations
- 2019Photoassisted atomic layer deposition of oxides employing alkoxides as single-source precursorscitations
- 2019Atomic Layer Deposition of PbI₂ Thin Filmscitations
- 2019Atomic Layer Deposition of Emerging 2D Semiconductors, HfS2 and ZrS2, for Optoelectronicscitations
- 2019Toward epitaxial ternary oxide multilayer device stacks by atomic layer depositioncitations
- 2018Rhenium Metal and Rhenium Nitride Thin Films Grown by Atomic Layer Depositioncitations
- 2018Metal oxide multilayer hard mask system for 3D nanofabricationcitations
- 2018Atomic Layer Deposition of Zirconium Dioxide from Zirconium Tetraiodide and Ozonecitations
- 2018Atomic Layer Deposition of Rhenium Disulfidecitations
- 2017As2S3 thin films deposited by atomic layer depositioncitations
- 2017(Invited) Photo-Assisted ALDcitations
- 2016Electric and Magnetic Properties of ALD-Grown BiFeO3 Filmscitations
- 2016Atomic Layer Deposition of Iridium Thin Films Using Sequential Oxygen and Hydrogen Pulsescitations
- 2016Bismuth iron oxide thin films using atomic layer deposition of alternating bismuth oxide and iron oxide layerscitations
- 2015Atomic layer deposition of zirconium dioxide from zirconium tetrachloride and ozonecitations
- 2015(Et3Si)2Se as a precursor for atomic layer deposition: growth analysis of thermoelectric Bi2Se3citations
- 2015Impedance spectroscopy study of the unipolar and bipolar resistive switching states of atomic layer deposited polycrystalline ZrO2 thin filmscitations
- 2015Studies on atomic layer deposition of IRMOF-8 thin filmscitations
- 2015Selective etching of focused gallium ion beam implanted regions from silicon as a nanofabrication methodcitations
- 2015Atomic Layer Deposition and Characterization of Bi2Te3 Thin Filmscitations
- 2015(Et3Si)(2)Se as a precursor for atomic layer depositioncitations
- 2014Combining focused ion beam and atomic layer deposition in nanostructure fabricationcitations
- 2014Sealing of Hard CrN and DLC Coatings with Atomic Layer Depositioncitations
- 2014Metal oxide films
- 2011Corrosion Protection of Steel with Oxide Nanolaminates Grown by Atomic Layer Depositioncitations
- 2007Degradation effects in TlBr single crystals under prolonged bias voltagecitations
- 2006Atomic layer deposition of ferroelectric bismuth titanate Bi4Ti3O12 thin filmscitations
- 2005New approach to the ALD of Bismuth silicatescitations
Places of action
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article
3D-printed sensor electric circuits using atomic layer deposition
Abstract
3D-printing, also known as additive manufacturing, has enabled the production of dynamically shaped objects often customized for specific applications. Many applications, such as sensors in the aerospace industry, have demanding mass and volume requirements or need to work in challenging environments that necessitate electronics to be protected. The combination of 3D-printing and electronics could open up new applications not feasible previously. We propose a novel manufacturing method capable of integrating a complex electric circuit consisting of several, commonly available electronic components with a 3D-printed object. This is achieved using a commercial printer and atomic layer deposition for coating. Various printable polymers and coatings were tested to identify two polymers that could be printed into one object, allowing selective conductivity when coated with conductive coating. Selective conductivity is achieved when one polymer exhibits poorer and more non-continuous coating growth compared to the other. The 3D-printed object’s three-dimensional shape and details were used to create the electrical circuit and aid in achieving selective conductivity. A demonstration consisting of an ultraviolet light (UV) sensor, based on an existing traditional circuit board, was replicated using this method. The 3D-printed circuit was then tested by comparing its output with that of the original when placed under the same UV-light source. The novel circuit output closely followed the original. The presented method can combine an electric circuit with the dynamic capabilities of a 3D-printer, allowing for savings in existing applications as well as new applications. ; Peer reviewed