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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Seo, Sehun
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Topics
Publications (4/4 displayed)
- 2021Growth of Transition Metal Dichalcogenide Heterojunctions with Metal Oxides for Metal–Insulator–Semiconductor Capacitorscitations
- 2019Direct In Situ Growth of Centimeter-Scale Multi-Heterojunction MoS 2 /WS 2 /WSe 2 Thin-Film Catalyst for Photo-Electrochemical Hydrogen Evolutioncitations
- 2017High critical current density over 1MAcm(-2) at 13T in BaZrO3 incorporated Ba(Fe,Co)(2)As-2 thin filmcitations
- 2016Thermally activated flux flow in superconducting epitaxial FeSe0.6Te0.4 thin filmcitations
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article
Thermally activated flux flow in superconducting epitaxial FeSe0.6Te0.4 thin film
Abstract
The thermally activated flux flow effect has been studied in epitaxial FeSe0.6Te0.4 thin film grown by a PLD method through the electrical resistivity measurement under various magnetic fields for B//c and B//ab. The results showed that the thermally activated flux flow effect is well described by the nonlinear temperature-dependent activation energy. The evaluated apparent activation energy U-0(B) is one order larger than the reported results and showed the double-linearity in both magnetic field directions. Furthermore, the FeSe0.6Te0.4 thin film shows the anisotropy of 5.6 near T-c and 2D-like superconducting behavior in thermally activated flux flow region. In addition, the vortex glass transition and the temperature dependence of the high critical fields were determined. (C) 2017 The Authors. Published by Elsevier B. V. This is an open access article under the CC BY-NC-ND license.