Materials Map

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The Materials Map is an open tool for improving networking and interdisciplinary exchange within materials research. It enables cross-database search for cooperation and network partners and discovering of the research landscape.

The dashboard provides detailed information about the selected scientist, e.g. publications. The dashboard can be filtered and shows the relationship to co-authors in different diagrams. In addition, a link is provided to find contact information.

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The Materials Map is still under development. In its current state, it is only based on one single data source and, thus, incomplete and contains duplicates. We are working on incorporating new open data sources like ORCID to improve the quality and the timeliness of our data. We will update Materials Map as soon as possible and kindly ask for your patience.

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Publications (1/1 displayed)

  • 2009Temperature effect on the electrical properties of undoped NiO thin films68citations

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Khan, K. A.
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2009

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  • Khan, K. A.
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article

Temperature effect on the electrical properties of undoped NiO thin films

  • Khan, K. A.
  • Hakim, A.
Abstract

<p>Undoped NiO thin films have been prepared onto glass substrate by e-beam evaporation of the element Ni in vacuum at ∼2 × 10<sup>-4</sup> Pa. The as-deposited Ni films were then oxidized in air by heating about 2 h at a temperature of 470 K and then the oxidized Ni films are turned into NiO thin films. From the deposition time and film thickness after annealing in air, an effective deposition rate of NiO thin films was about 6.67 nms<sup>-1</sup>. X-ray diffraction (XRD) study shows the NiO films are amorphous in nature. SEM studies of the surface morphology of NiO films exhibit a smooth and homogeneous growth on the entire surface. The elemental composition of NiO films is estimated by Energy Dispersive Analysis of X-rays (EDAX) method. The effects of temperature on the electrical properties of NiO thin films were studied in details. The heating and cooling cycles of the samples are reversible in the investigated temperature range after successive heat-treatment in air. Thickness dependence of conductivity is well in conformity with the Fuchs-Sondheimer theory. Temperature dependence of electrical conductivity shows a semiconducting behavior with activation energy. The thickness dependence of activation energy as well as thermopower studies was done within 293-473 K temperature range, respectively. Thermopower study indicates the NiO films a p-type semiconductor. Optical study in the wavelength range 0.3 &lt; λ&lt;1.2 μm range exhibits a high transmittance in the visible as well as in the near infra-red. Calculation from the optical data, the NiO sample exhibits a band gap at 3.11 eV, which does agree well with earlier reported values. These studies may be of importance for the application of this material in energy efficient surface coating devices.</p>

Topics
  • Deposition
  • impedance spectroscopy
  • surface
  • amorphous
  • scanning electron microscopy
  • x-ray diffraction
  • theory
  • thin film
  • glass
  • glass
  • annealing
  • activation
  • Energy-dispersive X-ray spectroscopy
  • electrical conductivity
  • evaporation
  • p-type semiconductor