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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Paven-Thivet, Claire Le
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Topics
Publications (9/9 displayed)
- 2014Miniaturized notch antenna based on lanthanum titanium perovskite oxide thin filmscitations
- 2014Lanthanum titanium perovskite compound: Thin film deposition and high frequency dielectric characterizationcitations
- 2013Influence of the sputtering reactive gas on the oxide and oxynitride LaTiON deposition by RF magnetron sputteringcitations
- 2012Dielectric oxynitride LaTiO<sub>x</sub>N<sub>y</sub> thin films deposited by reactive radio-frequency sputteringcitations
- 2011Perovskite oxynitride LaTiOxNy thin films : Dielectric characterization in low and high frequenciescitations
- 2010Oxynitrides Perovskites Thin Films : Photoelectrochemical Measurement Under Visible Light
- 2009Photoelectrochemical Properties of Crystalline Perovskite Lanthanum Titanium Oxynitride Films under Visible Light.citations
- 2008Structural and dielectric properties of oxynitride perovskite LaTiOxNy thin filmscitations
- 2007Oxynitride perovskite LaTiO<sub>x</sub>N<sub>y</sub> thin films deposited by reactive sputteringcitations
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article
Oxynitride perovskite LaTiO<sub>x</sub>N<sub>y</sub> thin films deposited by reactive sputtering
Abstract
This paper reports on the first study of structural and optical properties of reactively RF-sputtered lanthanum titanium oxynitride thin films using an original oxynitride LaTiO<sub>2</sub>N target and an argon-nitrogen mixture as reactive plasma. The depositions were carried out by varying the process parameters such as RF power, total pressure, argon and nitrogen rates and substrate temperature. Wavelength dispersive spectrometry (WDS), X-ray diffraction (XRD), scanning electron microscopy (SEM) and UV-visible spectroscopy show that titanate lanthanum oxynitride compounds can exist as a domain composition, LaTiO<sub>x</sub>N<sub>y</sub>. Films prepared in pure argon are oxide films, transparent, amorphous and insulating. Polycrystalline and [001]-textured oxynitride thin films, with different nitrogen contents, can be deposited on SrTiO<sub>3</sub> substrates, depending on the sputtering conditions. As expected, the introduction of nitrogen in the coatings leads to a band gap narrowing. Oxynitrides' thin films are thus coloured and semiconductive.