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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Vishnyakov, Vm
University of Huddersfield
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (30/30 displayed)
- 2022Reactively sintered TiB2-based heteromodulus UHT ceramics with in-situ formed graphene for machinable concentrated solar light absorberscitations
- 2022High Densification of Tungsten via Hot Pressing at 1300 °C in Carbon Presencecitations
- 2022Reaction Sintering of Biocompatible Al2O3-hBN Ceramicscitations
- 2022Reaction Sintering of Machinable TiB2-BN-C Ceramics with In-Situ Formed h-BN Nanostructurecitations
- 2021Integrated Nanomechanical Characterisation of Hard Coatingscitations
- 2021Thermal conductivity and thermal shock resistance of TiB2-based UHTCs enhanced by graphite plateletscitations
- 2021Corrosion performance and mechanical properties of FeCrSiNb amorphous equiatomic HEA thin filmcitations
- 2021Deviating from the pure MAX phase conceptcitations
- 2021Single-phase FeMnNiAl compositionally complex alloycitations
- 2020Demanding applications in harsh environment–FeCrMnNiC amorphous equiatomic alloy thin filmcitations
- 2020Reactive hot pressing route for dense ZrB2-SiC and ZrB2-SiC-CNT ultra-high temperature ceramicscitations
- 2020Effect of aluminium concentration on phase formation and radiation stability of Cr2Al x C thin filmcitations
- 2019Mechanisms of TiB2 and graphite nucleation during TiC–B4C high temperature interactioncitations
- 2019Reactive sintering of TiB2-SiC-CNT ceramicscitations
- 2018Synthesis and characterisation of high-entropy alloy thin films as candidates for coating nuclear fuel cladding alloyscitations
- 2018Use of ion-assisted sputtering technique for producing photocatalytic titanium dioxide thin filmscitations
- 2017Structure formation of TiB2-TiC-B4C-C hetero-modulus ceramics via reaction hot pressingcitations
- 2017Nano-scratch testing of (Ti,Fe)Nx thin films on siliconcitations
- 2017Fracture toughness in some hetero-modulus composite carbidescitations
- 2015Development of DLC coating architectures for demanding functional surface applications through nano- and micro-mechanical testingcitations
- 2015Interface Dynamics in Strained Polymer Nanocompositescitations
- 2013Ti3SiC2-formation during Ti-C-Si multilayer deposition by magnetron sputtering at 650°ccitations
- 2013Nanoscale Friction Measurements Up to 750 °Ccitations
- 2011Amorphous boron containing silicon carbo-nitrides created by ion sputteringcitations
- 2011Photocatalytic activity of reactively sputtered and directly sputtered titania coatingscitations
- 2010Physicomechanical properties of ultrahigh temperature heteromodulus ceramics based on group 4 transition metal carbidescitations
- 2010Comparison of Ti-Zr-V nonevaporable getter films deposited using alloy or twisted wire sputter-targetscitations
- 2006Single ion-induced amorphous zones in silicon
- 2006Influence of mechanical properties on the nanoscratch behaviour of hard nanocomposite TiN/Si3N4 coatings on Sicitations
- 2005Study of nanocrystalline TiN/Si3N4 thin films deposited using a dual ion beam methodcitations
Places of action
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article
Use of ion-assisted sputtering technique for producing photocatalytic titanium dioxide thin films
Abstract
<p>Titanium dioxide thin films were deposited by the reactive ion-assisted sputtering method from titanium targets at various partial pressures and deposition parameters. The films were deposited onto substrates at temperatures ranging from room-temperature conditions to 722 K. A selection of thin films was post-deposited annealed at temperatures up to 972 K for 10 min and characterized by micro-Raman spectroscopy and scanning electron microscopy (SEM) and subsequently analysed to assess their photocatalytic activity. Micro-Raman characterization revealed that the as-deposited films had either predominant amorphous, rutile-like structures, anatase-like structures or anatase-rutile mixed structures. The thin films deposited with a high substrate temperature and with energy assistance from the ion source tended to be amorphous, while films deposited on a hot substrate without ion energy assistance tended to have a mixed crystalline phase. On subsequent annealing the amorphous films changed to a rutile structure at temperatures above 672 K, while mixed anatase-rutile films changed to predominant rutile structures only after thermal treatments above 872 K. Thus, this study has revealed an astonishing persistence of the anatase-rutile mixed phase at very high temperatures and showed the possible existence of a key transition temperature at 672 K, where it was possible to see a transformation from amorphous or mixed phase to a rutile or dominant rutile mixed phase. Photocatalytic tests were undertaken by using a novel method consisting of observing the degradation of a film of stearic acid by the thin films under artificial UV radiation. Of the films investigated those with anatase-rutile mixed phases showed the greatest photoactivity. This work was essential in the understanding of the correlation between growth deposition conditions, phase transitions and photocatalytic activity. This set of experiments demonstrated that titania made under a highly oxidizing atmosphere, with no temperature applied on the substrate during fabrication and using an ion sputtering method, is a useful and valuable novel method for creating active TiO<sub>2</sub> thin films.</p>