| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Takayama, Osamu
Technical University of Denmark
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (32/32 displayed)
- 2024Alternative Plasmonic Materials for Biochemical Sensing: a Review (Invited Review)citations
- 2024Titanium Nitride Nanotrench Metasurfaces for Mid-infrared Chemical Sensingcitations
- 2023Optical properties of plasmonic titanium nitride thin films from ultraviolet to mid-infrared wavelengths deposited by pulsed-DC sputtering, thermal and plasma-enhanced atomic layer depositioncitations
- 2022Optical, structural and composition properties of silicon nitride films deposited by reactive radio-frequency sputtering, low pressure and plasma-enhanced chemical vapor depositioncitations
- 2022Optical, structural and composition properties of silicon nitride films deposited by reactive radio-frequency sputtering, low pressure and plasma-enhanced chemical vapor depositioncitations
- 2021Thickness-dependent optical properties of aluminum nitride films for mid-infrared wavelengthscitations
- 2020Microspherical nanoscopy: is it a reliable technique?citations
- 2020Microspherical nanoscopy: is it a reliable technique?citations
- 2020Fabrication of hollow coaxial Al 2 O 3 /ZnAl 2 O 4 high aspect ratio freestanding nanotubes based on the Kirkendall effectcitations
- 2020Fabrication of hollow coaxial Al2O3/ZnAl2O4 high aspect ratio freestanding nanotubes based on the Kirkendall effectcitations
- 2020Wave Front Tuning of Coupled Hyperbolic Surface Waves on Anisotropic Interfacescitations
- 2019Doped silicon plasmonic nanotrench structures for mid-infrared molecular sensing
- 2019Optical properties of titanium nitride films under low temperature
- 2019Optical properties of titanium nitride films under low temperature
- 2019Cryogenic characterization of titanium nitride thin filmscitations
- 2019Doped silicon plasmonic nanotrench structures for mid-infrared molecular sensing
- 2019Optics with hyperbolic materialscitations
- 2019Plasmonic Characterization of Titanium Nitride Films under Low Temperatures
- 2019Plasmonic Characterization of Titanium Nitride Films under Low Temperatures
- 2019Optics with hyperbolic materialscitations
- 2019Lamellas metamaterials: Properties and potential applications
- 2019Lamellas metamaterials: Properties and potential applications
- 2018Initial Investigation for the Fabrication of Hyperbolic Metamaterials Based on Ultra-Thin Au Layers
- 2018Experimental observation of Dyakonov plasmons in the mid-infraredcitations
- 2017Advanced fabrication of hyperbolic metamaterials
- 2017Large-scale high aspect ratio Al-doped ZnO nanopillars arrays as anisotropic metamaterials.citations
- 2017Highly ordered Al-doped ZnO nano-pillar and tube structures as hyperbolic metamaterials for mid-infrared plasmonics
- 2016Highly doped InP as a low loss plasmonic material for mid-IR regioncitations
- 2016Fabrication of high aspect ratio TiO2 and Al2O3 nanogratings by atomic layer depositioncitations
- 2016Conductive Oxides Trench Structures as Hyperbolic Metamaterials in Mid-infrared Range
- 2016Fabrication of high aspect ratio TiO 2 and Al 2 O 3 nanogratings by atomic layer depositioncitations
- 2016Fabrication of deep-profile Al-doped ZnO one- and two-dimensional lattices as plasmonic elements
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article
Optical properties of plasmonic titanium nitride thin films from ultraviolet to mid-infrared wavelengths deposited by pulsed-DC sputtering, thermal and plasma-enhanced atomic layer deposition
Abstract
We present a comparative study of the optical properties of 50 nm-thick titanium nitride (TiN) films deposited on a silicon substrate by pulsed-DC sputtering, thermal, and plasma-enhanced atomic layer deposition. Silicon was chosen as the optimal material for the complementary metal–oxide–semiconductor (CMOS) integration. Using ellipsometry and Fourier-transform infrared (FTIR) spectroscopy, broadband permittivity of the films was obtained from a series of free-space reflection measurements in the wavelength range of 210 nm to μ m (47619–500 cm −1 ). Our particular focus is on the influence of the deposition method and its process temperature on the TiN plasmonic properties. We used grazing incidence X-ray diffraction, X-ray photoelectron spectroscopy, X-ray reflectometry, atomic force microscopy, and electrical resistivity measurements to analyze the composition of thin films and to elucidate the effect of different deposition parameters on their optical properties. All measurements were carried out at room temperature and the thickness of all film samples was fixed to 50 nm to exclude the influence of these factors on the optical properties. We demonstrate that PEALD-deposited films have smoother surfaces than those deposited by the sputtering technique, while sputtered films have higher densities. In addition, by changing the temperature of both processes, it is possible to influence the stoichiometry and crystal orientation of the layers. Based on this characterization, we found out that TiN thin film deposited by pulsed-DC at 600 °C gives the best plasmonic response (high negative permittivity ε 1 and relatively low losses associated with ε 2 , where ε 2 and ε 2 are the real and imaginary parts of permittivity, respectively) among all samples for the entire wavelength range under study. The same film also exhibits the excellent resistivity of 29 µ Ω. These results suggest that there is a direct relationship between stoichiometry, structural quality, and oxygen incorporation in TiN films and their plasmonic ...