• Miley, Harry S.
• Aalseth, Craig E.
• Day, Anthony R.
• Edwards, Danny J.
• Smart, John E.
• Schulte, Shannon M.
• Bachelor, Paula P.
• Seifert, Allen
• Warren, Glen A.
• Mcintyre, Justin I.
• Hoppe, Eric W.
• Hossbach, Todd W.
• Litke, Kevin E.

Abstract

High-purity copper is an attractive material for constructing ultra-low-background radiation measurement devices. Many low-background experiments using high-purity copper have indicated surface contamination emerges as the dominant background. Radon daughters plate out on exposed surfaces, leaving a residual 210Pb background that is difficult to avoid. Dust is also a problem; even under cleanroom conditions, the amount of U and Th deposited on surfaces can represent the largest remaining background. To control these backgrounds, a copper cleaning chemistry has been developed. Designed to replace an effective, but overly aggressive concentrated nitric acid etch, this peroxide-based solution allows for a more controlled cleaning of surfaces. The acidified hydrogen peroxide solution will generally target the Cu+/Cu2+ species which are the predominant surface participants, leaving the bulk of copper metal intact. This preserves the critical tolerances of parts and eliminates significant waste disposal issues. Accompanying passivation chemistry has also been developed that protects copper surfaces from oxidation. Using a high-activity polonium surface spike, the most difficult-to-remove daughter isotope of radon, the performance of these methods are quantified. © 2001 Elsevier Science. All rights reserved

Topics

• impedance spectroscopy
• surface
• experiment
• Hydrogen
• copper
• Polonium