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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Kočí, Jan | Prague |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Ali, M. A. |
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| Rančić, M. |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Suominen, Milla
Aalto University
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (3/3 displayed)
- 2023Electrochemical reduction of carbon dioxide to formate in a flow cell on CuSx grown by atomic layer depositioncitations
- 2019Electropolymerized polyazulene as active material in flexible supercapacitorscitations
- 2017Electropolymerized polyazulene as active material in flexible supercapacitorscitations
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article
Electrochemical reduction of carbon dioxide to formate in a flow cell on CuSx grown by atomic layer deposition
Abstract
<p>Transition metal chalcogenides (TMCs) are promising pre-catalysts for tuning the selectivity of electrochemical carbon dioxide (CO<sub>2</sub><sub>)</sub> reduction (CO2R). Atomic layer deposition (ALD) enables well-controlled growth of thin TMC films on various gas diffusion electrodes. Herein, we have studied the CO2R performance of ALD-grown copper sulfide (CuS<sub>x</sub>) in a flow cell. The effects of electrode configuration, electrolyte concentration, temperature, and electrolysis time were carefully studied, combined with pre- and post-electrolysis physico-chemical analyses of the films. The unique selectivity of sulfur-doped Cu towards formate was retained with Faradaic efficiencies between 40 and 60%, but slow selectivity changes were observed over time. Major loss of sulfur was encountered during the initial 5-min reduction period, and after that, progressive formation of nanoparticles could be observed. Comparisons to ALD-grown Cu thin film and CuS<sub>x</sub>-modified Cu foam electrodes verified the importance of sulfur and suggested that other electrocatalyst films could be easily realized with ALD.</p>