693.932 PEOPLE
| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Mizohata, Kenichiro
University of Helsinki
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (99/99 displayed)
- 2024Atomic Layer Deposition of ScF3 and ScxAl yFz Thin Filmscitations
- 2024Atomic Layer Deposition of Molybdenum Carbide Thin Filmscitations
- 2024Atomic Layer Deposition of Molybdenum Carbide Thin Filmscitations
- 2024Suppression of helium migration in arc-melted and 3D-printed CoCrFeMnNi high entropy alloycitations
- 2024Suppression of helium migration in arc-melted and 3D-printed CoCrFeMnNi high entropy alloycitations
- 2024Solubility of Hydrogen in a WMoTaNbV High-Entropy Alloycitations
- 2024Unravelling the effect of nitrogen on the morphological evolution of thin silver films on weakly-interacting substratescitations
- 2023Deformation behaviour of ion-irradiated FeCr : A nanoindentation studycitations
- 2023Molecular layer deposition of hybrid silphenylene-based dielectric filmcitations
- 2023Atomic Layer Deposition and Pulsed Chemical Vapor Deposition of SnI2 and CsSnI3citations
- 2023Hydrogen isotope exchange experiments in high entropy alloy WMoTaNbVcitations
- 2023Effect of atomic layer annealing in plasma-enhanced atomic layer deposition of aluminum nitride on silicon
- 2023Atomic Layer Deposition and Pulsed Chemical Vapor Deposition of SnI2 and CsSnI3citations
- 2023Atomic Layer Deposition of Boron-Doped Al2O3 Dielectric Filmscitations
- 2022Size dependent swift heavy ion induced Au nanoparticle elongation in SiO2 matrixcitations
- 2022Irradiation Damage Independent Deuterium Retention in WMoTaNbVcitations
- 2022Atomic layer deposition of GdF 3 thin filmscitations
- 2022Characterization of Heavily Irradiated Dielectrics for Pixel Sensors Coupling Insulator Applicationscitations
- 2022Characterization of Heavily Irradiated Dielectrics for Pixel Sensors Coupling Insulator Applicationscitations
- 2022Identifying Regions-of-Interest and Extracting Gold from PCBs Using MHz HIFUcitations
- 2022Atomic layer deposition of PbCl2, PbBr2 and mixed lead halide (Cl, Br, I) PbXnY2-n thin filmscitations
- 2022Deformation behaviour of ion-irradiated FeCrcitations
- 2022Modified deformation behaviour of self-ion irradiated tungsten : A combined nano-indentation, HR-EBSD and crystal plasticity studycitations
- 2022Atomic layer deposition of GdF3 thin filmscitations
- 2022Characterising Ion-Irradiated FeCr : Hardness, Thermal Diffusivity and Lattice Straincitations
- 2022Atomic layer deposition of GdF3thin filmscitations
- 2022High-fidelity patterning of AlN and ScAlN thin films with wet chemical etchingcitations
- 2022High-fidelity patterning of AlN and ScAlN thin films with wet chemical etchingcitations
- 2021Atomic layer deposition of TbF3 thin filmscitations
- 2021Atomic layer deposition of TbF3 thin filmscitations
- 2021Rhenium Metal and Rhenium Nitride Thin Films Grown by Atomic Layer Depositioncitations
- 2021Highly Material Selective and Self-Aligned Photo-assisted Atomic Layer Deposition of Copper on Oxide Materialscitations
- 2021Volumes of Worth—Delimiting the Sample Size for Radiocarbon Dating of Parchmentcitations
- 2021Highly conductive and stable Co9S8 thin films by atomic layer deposition : from process development and film characterization to selective and epitaxial growthcitations
- 2021Atomic Layer Deposition of Rhenium Disulfidecitations
- 2021Highly conductive and stable Co9S8 thin films by atomic layer depositioncitations
- 2021Ionic conductivity in LixTaOy thin films grown by Atomic Layer Deposition (ALD)citations
- 2020Preparation and In vivo Evaluation of Red Blood Cell Membrane Coated Porous Silicon Nanoparticles Implanted with 155Tbcitations
- 2020Al2O3 Thin Films Prepared by a Combined Thermal-Plasma Atomic Layer Deposition Process at Low Temperature for Encapsulation Applicationscitations
- 2020Al 2 O 3 Thin Films Prepared by a Combined Thermal-Plasma Atomic Layer Deposition Process at Low Temperature for Encapsulation Applicationscitations
- 2020Atomic Layer Deposition of Nickel Nitride Thin Films using NiCl2(TMPDA) and Tert‐Butylhydrazine as Precursorscitations
- 2020Comparative study of deuterium retention in irradiated Eurofer and Fe–Cr from a new ion implantation materials facilitycitations
- 2020Ionic conductivity in LixTaOy thin films grown by atomic layer depositioncitations
- 2020Characterising Ion-Irradiated FeCrcitations
- 2020Atomic Layer Deposition of Intermetallic Co3Sn2 and Ni3Sn2 Thin Filmscitations
- 2020Photoassisted atomic layer deposition of oxides employing alkoxides as single-source precursorscitations
- 2020Modified deformation behaviour of self-ion irradiated tungstencitations
- 2020Magnetic properties and resistive switching in mixture films and nanolaminates consisting of iron and silicon oxides grown by atomic layer depositioncitations
- 2020Atomic Layer Deposition of PbS Thin Films at Low Temperaturescitations
- 2020Comparative study of deuterium retention in irradiated Eurofer and Fe-Cr from a new ion implantation materials facilitycitations
- 2019As2S3 thin films deposited by atomic layer depositioncitations
- 2019Crystalline tungsten sulfide thin films by atomic layer deposition and mild annealingcitations
- 2019Atomic Layer Deposition of Nickel Nitride Thin Films using NiCl2(TMPDA) and Tert‐Butylhydrazine as Precursorscitations
- 2019Nickel Germanide Thin Films by Atomic Layer Depositioncitations
- 2019Atomic layer deposition of cobalt(II) oxide thin films from Co(BTSA)(2)(THF) and H2Ocitations
- 2019Atomic Layer Deposition of Intermetallic Co3Sn2 and Ni3Sn2 Thin Filmscitations
- 2019Photoassisted atomic layer deposition of oxides employing alkoxides as single-source precursorscitations
- 2019Photoassisted atomic layer deposition of oxides employing alkoxides as single-source precursorscitations
- 2019Atomic Layer Deposition of Photoconductive Cu2O Thin Filmscitations
- 2019Atomic Layer Deposition of Crystalline MoS2 Thin Films : New Molybdenum Precursor for Low-Temperature Film Growthcitations
- 2019Optical characteristics of virgin and proton-irradiated ceramics of magnesium aluminate spinelcitations
- 2019Atomic Layer Deposition of PbI₂ Thin Filmscitations
- 2019Intercalation of Lithium Ions from Gaseous Precursors into beta-MnO2 Thin Films Deposited by Atomic Layer Depositioncitations
- 2019Atomic Layer Deposition of Emerging 2D Semiconductors, HfS2 and ZrS2, for Optoelectronicscitations
- 2019Atomic Layer Deposition of Molybdenum and Tungsten Oxide Thin Films Using Heteroleptic Imido-Amidinato Precursors : Process Development, Film Characterization, and Gas Sensing Propertiescitations
- 2019Intercalation of Lithium Ions from Gaseous Precursors into β-MnO 2 Thin Films Deposited by Atomic Layer Depositioncitations
- 2019Toward epitaxial ternary oxide multilayer device stacks by atomic layer depositioncitations
- 2018Rhenium Metal and Rhenium Nitride Thin Films Grown by Atomic Layer Depositioncitations
- 2018Atomic layer deposition of crystalline molybdenum oxide thin films and phase control by post-deposition annealingcitations
- 2018Atomic layer deposition of crystalline molybdenum oxide thin films and phase control by post-deposition annealingcitations
- 2018Atomic layer deposition of lanthanum oxide with heteroleptic cyclopentadienyl-amidinate lanthanum precursor - Effect of the oxygen source on the film growth and propertiescitations
- 2018Atomic Layer Deposition of Zirconium Dioxide from Zirconium Tetraiodide and Ozonecitations
- 2018Atomic Layer Deposition of Rhenium Disulfidecitations
- 2018Diamine Adduct of Cobalt(II) Chloride as a Precursor for Atomic Layer Deposition of Stoichiometric Cobalt(II) Oxide and Reduction Thereof to Cobalt Metal Thin Filmscitations
- 2018Atomic Layer Deposition of Molybdenum and Tungsten Oxide Thin Films Using Heteroleptic Imido-Amidinato Precursorscitations
- 2017As2S3 thin films deposited by atomic layer depositioncitations
- 2017Thermal Atomic Layer Deposition of Continuous and Highly Conducting Gold Thin Filmscitations
- 2017(Invited) Photo-Assisted ALDcitations
- 2017Atomic Layer Deposition of Zinc Glutarate Thin Filmscitations
- 2017Low-Temperature Atomic Layer Deposition of Low-Resistivity Copper Thin Films Using Cu(dmap)(2) and Tertiary Butyl Hydrazinecitations
- 2017Atomic Layer Deposition of Crystalline MoS2 Thin Filmscitations
- 2017Studies on Thermal Atomic Layer Deposition of Silver Thin Filmscitations
- 2017Preparation of Lithium Containing Oxides by the Solid State Reaction of Atomic Layer Deposited Thin Filmscitations
- 2016Potential gold(I) precursors evaluated for atomic layer depositioncitations
- 2016Atomic layer deposition of aluminum oxide on modified steel substratescitations
- 2016Effect of precursor chemistry on residual stress of ALD Al 2 O 3 and TiO 2 films
- 2016Heteroleptic Cyclopentadienyl-Amidinate Precursors for Atomic Layer Deposition (ALD) of Y, Pr, Gd, and Dy Oxide Thin Filmscitations
- 2016Electric and Magnetic Properties of ALD-Grown BiFeO3 Filmscitations
- 2016Atomic Layer Deposition of Iridium Thin Films Using Sequential Oxygen and Hydrogen Pulsescitations
- 2016Highly conformal TiN by atomic layer deposition:growth and characterization
- 2016Nucleation and conformality of iridium and iridium oxide thin films grown by atomic layer depositioncitations
- 2016Bismuth iron oxide thin films using atomic layer deposition of alternating bismuth oxide and iron oxide layerscitations
- 2015Atomic layer deposition of zirconium dioxide from zirconium tetrachloride and ozonecitations
- 2015(Et3Si)2Se as a precursor for atomic layer deposition: growth analysis of thermoelectric Bi2Se3citations
- 2015Charge and current hysteresis in dysprosium-doped zirconium oxide thin filmscitations
- 2015Selective etching of focused gallium ion beam implanted regions from silicon as a nanofabrication methodcitations
- 2015Atomic Layer Deposition and Characterization of Bi2Te3 Thin Filmscitations
- 2015(Et3Si)(2)Se as a precursor for atomic layer depositioncitations
- 2010Rare earth scandate thin films by atomic layer depositioncitations
Places of action
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article
High-fidelity patterning of AlN and ScAlN thin films with wet chemical etching
Abstract
We report on the anisotropic wet etching of sputtered AlN and Sc<sub>0.2</sub>Al<sub>0.8</sub>N thin films. With tetramethyl ammonium hydroxide at 80 °C, the etch rates along the c-axis were 330 and 30 nm/s for AlN and Sc<sub>0.2</sub>Al<sub>0.8</sub>N, respectively. Although the etching was anisotropic, significant lateral etching below the mask occurred, perpendicular to the c-axis. With a 1 µm Sc<sub>0.2</sub>Al<sub>0.8</sub>N film, it could be up to 1800 nm. We studied the lateral etching with molybdenum, SiO<sub>2</sub>, SiN<sub>x</sub> and TiO<sub>2</sub> masks, and found the leading cause for the lateral etching to be modification of the AlN or Sc<sub>0.2</sub>Al<sub>0.8</sub>N surface caused by ion bombardment and surface oxidation by ambient air. The lateral etching was reduced by optimizing the mask deposition and with thermal annealing. With Sc<sub>0.2</sub>Al<sub>0.8</sub>N, the lateral etching was reduced down to 35–220 nm depending on the mask, while with AlN, it was reduced to negligible. These results can be used for developing optimised mask deposition processes for better etch characteristics and for microfabrication of AlN and Sc<sub>x</sub>Al<sub>1‑x</sub>N thin-film structures.