| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Zdunek, Krzysztof
Warsaw University of Technology
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (15/15 displayed)
- 2021Synthesis of Copper Nitride Layers by the Pulsed Magnetron Sputtering Method Carried out under Various Operating Conditionscitations
- 2020Design of pulsed neon injection in the synthesis of W-B-C films using magnetron sputtering from a surface-sintered single powder cathodecitations
- 2020Surface sintering of tungsten powder targets designed by electromagnetic discharge: A novel approach for film synthesis in magnetron sputteringcitations
- 2019Plasmochemical investigations of DLC/WCx nanocomposite coatings synthesized by gas injection magnetron sputtering techniquecitations
- 2019Influence of annealing on electronic properties of thin AlN films deposited by magnetron sputtering method on silicon substratescitations
- 2018Relation between modulation frequency of electric power oscillation during pulse magnetron sputtering deposition of MoNx thin filmscitations
- 2018Phase composition of copper nitride coatings examined by the use of X-ray diffraction and Raman spectroscopycitations
- 2018Structure and electrical resistivity dependence of molybdenum thin films deposited by dc modulated pulsed magnetron sputteringcitations
- 2017Reactive sputtering of titanium compounds using the magnetron system with a grounded cathodecitations
- 2017Multi-sided metallization of textile fibres by using magnetron system with grounded cathodecitations
- 2016Determination of sp 3 fraction in ta-C coating using XPS and Raman spectroscopy
- 2016Titanium nitride coatings synthesized by IPD method with eliminated current oscillationscitations
- 2013Plasma etching of aluminum nitride thin films prepared by magnetron sputtering method
- 2010Structure of Fe-Cu coatings prepared by the magnetron sputtering method
- 2009Electric Characterization and Selective Etching of Aluminum Oxidecitations
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article
Phase composition of copper nitride coatings examined by the use of X-ray diffraction and Raman spectroscopy
Abstract
The Cu-N layers were deposited on non-heated substrates by means of the pulsed magnetron sputtering (PMS) method. Conducted studies were focused on the structural properties characterization and were performed by using Raman spectroscopy and X-ray diffraction techniques. Based on these studies, especially taking into account the Raman band shift as a control parameter, classification of the Cu-N coatings in terms of their chemical composition and phase structure (stoichiometry, supersaturation) were performed. Obtained results point to the conclusion that polycrystalline structure of Cu-N layers depends on the Cu-content. When the Cu-content increases, recorded lattice constant changes from 0.3817 nm to 0.388 nm. This phenomenon is accompanied by deviation from stoichiometry of the Cu3N phase. At the same time, Raman band shift from 635 cm−1 to 610 cm−1 is observed. Thus, obtained results point to the conclusion that the Raman spectroscopy technique allows to determine the relation between deviation of the system from the phase equilibrium in the function of the band shift.