693.932 PEOPLE
| People | Locations | Statistics |
|---|---|---|
| Naji, M. |
| |
| Motta, Antonella |
| |
| Aletan, Dirar |
| |
| Mohamed, Tarek |
| |
| Ertürk, Emre |
| |
| Taccardi, Nicola |
| |
| Kononenko, Denys |
| |
| Petrov, R. H. | Madrid |
|
| Alshaaer, Mazen | Brussels |
|
| Bih, L. |
| |
| Casati, R. |
| |
| Muller, Hermance |
| |
| Kočí, Jan | Prague |
|
| Šuljagić, Marija |
| |
| Kalteremidou, Kalliopi-Artemi | Brussels |
|
| Azam, Siraj |
| |
| Ospanova, Alyiya |
| |
| Blanpain, Bart |
| |
| Ali, M. A. |
| |
| Popa, V. |
| |
| Rančić, M. |
| |
| Ollier, Nadège |
| |
| Azevedo, Nuno Monteiro |
| |
| Landes, Michael |
| |
| Rignanese, Gian-Marco |
|
Ritala, Mikko
University of Helsinki
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (194/194 displayed)
- 2024Atomic Layer Deposition of ScF3 and ScxAl yFz Thin Filmscitations
- 2024Atomic Layer Deposition of Molybdenum Carbide Thin Filmscitations
- 2024Atomic Layer Deposition of Molybdenum Carbide Thin Filmscitations
- 2024Area-Selective Etching of Poly(methyl methacrylate) Films by Catalytic Decompositioncitations
- 2024Highly dispersed atomic layer deposited CrOx on SiO2 catalyst with enhanced yield of propylene for CO2 –mediated oxidative dehydrogenation of propanecitations
- 2024Area-Selective Etching of Poly(lactic acid) Films via Catalytic Hydrogenolysis and Crackingcitations
- 20243D-printed sensor electric circuits using atomic layer depositioncitations
- 2023Area-Selective Etching of Poly(methyl methacrylate) Films by Catalytic Decompositioncitations
- 2023Conversion of ALD CuO Thin Films into Transparent Conductive p-Type CuI Thin Filmscitations
- 2023Molecular layer deposition of hybrid silphenylene-based dielectric filmcitations
- 2023Effect of Atomic-Layer-Deposited Hydroxyapatite Coating on Surface Thrombogenicity of Titaniumcitations
- 2023Atomic Layer Deposition and Pulsed Chemical Vapor Deposition of SnI2 and CsSnI3citations
- 2023Oxygen and nitrogen plasma modifications of ZnCuCo LDH-graphene nanocomposites for photocatalytic hydrogen production and antibiotic degradationcitations
- 2023Atomic Layer Deposition and Pulsed Chemical Vapor Deposition of SnI2 and CsSnI3citations
- 2023Atomic Layer Deposition of Boron-Doped Al2O3 Dielectric Filmscitations
- 2022Highly dispersed atomic layer deposited CrOx on SiO2 catalyst with enhanced yield of propylene for CO2 –mediated oxidative dehydrogenation of propanecitations
- 2022Self-Aligned Thin-Film Patterning by Area-Selective Etching of Polymers
- 2022Titania Nanotubes/Hydroxyapatite Nanocomposites Produced with the Use of the Atomic Layer Deposition Technique: Estimation of Bioactivity and Nanomechanical Properties
- 2022Atomic layer deposition of GdF 3 thin filmscitations
- 2022Substrate-Dependent Area-Selective Atomic Layer Deposition of Noble Metals from Metal beta-Diketonate Precursorscitations
- 2022Atomic layer deposition of PbCl2, PbBr2 and mixed lead halide (Cl, Br, I) PbXnY2-n thin filmscitations
- 2022Atomic layer deposition of GdF3 thin filmscitations
- 2022Reaction mechanism studies on atomic layer deposition process of AlF3citations
- 2022Atomic layer deposition of GdF3thin filmscitations
- 2022Osteoblast Attachment on Titanium Coated with Hydroxyapatite by Atomic Layer Depositioncitations
- 2022Atomic Layer Deposition of CsI and CsPbI3citations
- 2021Atomic layer deposition of TbF3 thin filmscitations
- 2021Atomic layer deposition of TbF3 thin filmscitations
- 2021In situ reaction mechanism study on atomic layer deposition of intermetallic Co3Sn2 thin filmscitations
- 2021Rhenium Metal and Rhenium Nitride Thin Films Grown by Atomic Layer Depositioncitations
- 2021Constructing Spacecraft Components Using Additive Manufacturing and Atomic Layer Deposition : First Steps for Integrated Electric Circuitrycitations
- 2021Atomic Layer Deposition of 2D Metal Dichalcogenides for Electronics, Catalysis, Energy Storage, and Beyondcitations
- 2021Self-Aligned Thin-Film Patterning by Area-Selective Etching of Polymerscitations
- 2021Self-Aligned Thin-Film Patterning by Area-Selective Etching of Polymerscitations
- 2021Oxidative MLD of Conductive PEDOT Thin Films with EDOT and ReCl5 as Precursorscitations
- 2021Oxidative MLD of Conductive PEDOT Thin Films with EDOT and ReCl5 as Precursorscitations
- 2021Highly Material Selective and Self-Aligned Photo-assisted Atomic Layer Deposition of Copper on Oxide Materialscitations
- 2021Constructing Spacecraft Components Using Additive Manufacturing and Atomic Layer Deposition:First Steps for Integrated Electric Circuitrycitations
- 2021Constructing Spacecraft Components Using Additive Manufacturing and Atomic Layer Depositioncitations
- 2021Highly conductive and stable Co9S8 thin films by atomic layer deposition : from process development and film characterization to selective and epitaxial growthcitations
- 2021Atomic Layer Deposition of Rhenium Disulfidecitations
- 2021Combining Experimental and DFT Investigation of the Mechanism Involved in Thermal Etching of Titanium Nitride Using Alternate Exposures of NbF5 and CCl4, or CCl4 Onlycitations
- 2021Constructing Spacecraft Components Using Additive Manufacturing and Atomic Layer Deposition: First Steps for Integrated Electric Circuitrycitations
- 2021Highly conductive and stable Co9S8 thin films by atomic layer depositioncitations
- 2020In situ reaction mechanism study on atomic layer deposition of intermetallic Co3Sn2 thin filmscitations
- 2020Atomic Layer Deposition of Nickel Nitride Thin Films using NiCl2(TMPDA) and Tert‐Butylhydrazine as Precursorscitations
- 2020Atomic Layer Deposition of Intermetallic Co3Sn2 and Ni3Sn2 Thin Filmscitations
- 2020Photoassisted atomic layer deposition of oxides employing alkoxides as single-source precursorscitations
- 2020Magnetic properties and resistive switching in mixture films and nanolaminates consisting of iron and silicon oxides grown by atomic layer depositioncitations
- 2020Atomic Layer Deposition of PbS Thin Films at Low Temperaturescitations
- 2020Van der Waals epitaxy of continuous thin films of 2D materials using atomic layer deposition in low temperature and low vacuum conditionscitations
- 2020Atomic Layer Deposition and Performance of ZrO2-Al2O3 Thin Filmscitations
- 2020Photocatalytic and Gas Sensitive Multiwalled Carbon Nanotube/TiO2-ZnO and ZnO-TiO2 Composites Prepared by Atomic Layer Depositioncitations
- 2020Controlling Atomic Layer Deposition of 2D Semiconductor SnS(2)by the Choice of Substratecitations
- 2019As2S3 thin films deposited by atomic layer depositioncitations
- 2019Low-Temperature Wafer-Scale Deposition of Continuous 2D SnS2 Filmscitations
- 2019Crystalline tungsten sulfide thin films by atomic layer deposition and mild annealingcitations
- 2019Atomic Layer Deposition of Nickel Nitride Thin Films using NiCl2(TMPDA) and Tert‐Butylhydrazine as Precursorscitations
- 2019Nickel Germanide Thin Films by Atomic Layer Depositioncitations
- 2019Review Articlecitations
- 2019Titania Nanotubes/Hydroxyapatite Nanocomposites Produced with the Use of the Atomic Layer Deposition Technique : Estimation of Bioactivity and Nanomechanical Propertiescitations
- 2019Atomic layer deposition of cobalt(II) oxide thin films from Co(BTSA)(2)(THF) and H2Ocitations
- 2019Atomic Layer Deposition of Intermetallic Co3Sn2 and Ni3Sn2 Thin Filmscitations
- 2019Photoassisted atomic layer deposition of oxides employing alkoxides as single-source precursorscitations
- 2019Photoassisted atomic layer deposition of oxides employing alkoxides as single-source precursorscitations
- 2019Titania Nanotubes/Hydroxyapatite Nanocomposites Produced with the Use of the Atomic Layer Deposition Techniquecitations
- 2019Atomic Layer Deposition of Photoconductive Cu2O Thin Filmscitations
- 2019Atomic Layer Deposition of Crystalline MoS2 Thin Films : New Molybdenum Precursor for Low-Temperature Film Growthcitations
- 2019Atomic Layer Deposition of PbI₂ Thin Filmscitations
- 2019Intercalation of Lithium Ions from Gaseous Precursors into beta-MnO2 Thin Films Deposited by Atomic Layer Depositioncitations
- 2019Atomic Layer Deposition of Emerging 2D Semiconductors, HfS2 and ZrS2, for Optoelectronicscitations
- 2019Atomic Layer Deposition of Molybdenum and Tungsten Oxide Thin Films Using Heteroleptic Imido-Amidinato Precursors : Process Development, Film Characterization, and Gas Sensing Propertiescitations
- 2019Intercalation of Lithium Ions from Gaseous Precursors into β-MnO 2 Thin Films Deposited by Atomic Layer Depositioncitations
- 2019Toward epitaxial ternary oxide multilayer device stacks by atomic layer depositioncitations
- 2018Low-Temperature Wafer-Scale Deposition of Continuous 2D SnS2 Filmscitations
- 2018Rhenium Metal and Rhenium Nitride Thin Films Grown by Atomic Layer Depositioncitations
- 2018Atomic layer deposition of crystalline molybdenum oxide thin films and phase control by post-deposition annealingcitations
- 2018Atomic layer deposition of crystalline molybdenum oxide thin films and phase control by post-deposition annealingcitations
- 2018Atomic layer deposition of lanthanum oxide with heteroleptic cyclopentadienyl-amidinate lanthanum precursor - Effect of the oxygen source on the film growth and propertiescitations
- 2018Towards space-grade 3D-printed, ALD-coated small satellite propulsion components for fluidicscitations
- 2018Adhesion and mechanical properties of nanocrystalline hydroxyapatite coating obtained by conversion of atomic layer-deposited calcium carbonate on titanium substratecitations
- 2018Metal Fluorides as Lithium-Ion Battery Materials: An Atomic Layer Deposition Perspectivecitations
- 2018Metal oxide multilayer hard mask system for 3D nanofabricationcitations
- 2018Atomic Layer Deposition of Zirconium Dioxide from Zirconium Tetraiodide and Ozonecitations
- 2018Atomic Layer Deposition of Rhenium Disulfidecitations
- 2018Atomic Layer Deposition and Performance of ZrO2-Al2O3 Thin Filmscitations
- 2018Atomic Layer Deposition and Properties of HfO2-Al2O3 Nanolaminatescitations
- 2018Diamine Adduct of Cobalt(II) Chloride as a Precursor for Atomic Layer Deposition of Stoichiometric Cobalt(II) Oxide and Reduction Thereof to Cobalt Metal Thin Filmscitations
- 2018Atomic Layer Deposition of Molybdenum and Tungsten Oxide Thin Films Using Heteroleptic Imido-Amidinato Precursorscitations
- 2017As2S3 thin films deposited by atomic layer depositioncitations
- 2017Thermal Atomic Layer Deposition of Continuous and Highly Conducting Gold Thin Filmscitations
- 2017Atomic layer deposition of tin oxide thin films from bis[bis(trimethylsilyl)amino]tin(II) with ozone and watercitations
- 2017(Invited) Photo-Assisted ALDcitations
- 2017Atomic Layer Deposition of Zinc Glutarate Thin Filmscitations
- 2017Low-Temperature Atomic Layer Deposition of Low-Resistivity Copper Thin Films Using Cu(dmap)(2) and Tertiary Butyl Hydrazinecitations
- 2017Atomic layer deposited protective layerscitations
- 2017Atomic Layer Deposition of Crystalline MoS2 Thin Filmscitations
- 2017Studies on Thermal Atomic Layer Deposition of Silver Thin Filmscitations
- 2017Preparation of Lithium Containing Oxides by the Solid State Reaction of Atomic Layer Deposited Thin Filmscitations
- 2016Potential gold(I) precursors evaluated for atomic layer depositioncitations
- 2016Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectorscitations
- 2016Atomic layer deposition of aluminum oxide on modified steel substratescitations
- 2016Effect of precursor chemistry on residual stress of ALD Al 2 O 3 and TiO 2 films
- 2016Heteroleptic Cyclopentadienyl-Amidinate Precursors for Atomic Layer Deposition (ALD) of Y, Pr, Gd, and Dy Oxide Thin Filmscitations
- 2016Electric and Magnetic Properties of ALD-Grown BiFeO3 Filmscitations
- 2016Atomic Layer Deposition of Metal Phosphates and Lithium Silicates
- 2016The role of surface preparation in corrosion protection of copper with nanometer-thick ALD alumina coatingscitations
- 2016Structure-Dependent Mechanical Properties of ALD-Grown Nanocrystalline BiFeO3 Multiferroicscitations
- 2016Structure-Dependent Mechanical Properties of ALD-Grown Nanocrystalline BiFeO3 Multiferroicscitations
- 2016Atomic Layer Deposition of Iridium Thin Films Using Sequential Oxygen and Hydrogen Pulsescitations
- 2016Scalable Route to the Fabrication of CH3NH3PbI3 Perovskite Thin Films by Electrodeposition and Vapor Conversion.citations
- 2016Highly conformal TiN by atomic layer deposition:growth and characterization
- 2016Nucleation and conformality of iridium and iridium oxide thin films grown by atomic layer depositioncitations
- 2016Bismuth iron oxide thin films using atomic layer deposition of alternating bismuth oxide and iron oxide layerscitations
- 2015Atomic layer deposition of zirconium dioxide from zirconium tetrachloride and ozonecitations
- 2015(Et3Si)2Se as a precursor for atomic layer deposition: growth analysis of thermoelectric Bi2Se3citations
- 2015Impedance spectroscopy study of the unipolar and bipolar resistive switching states of atomic layer deposited polycrystalline ZrO2 thin filmscitations
- 2015Mechanical properties of aluminum, zirconium, hafnium and tantalum oxides and their nanolaminates grown by atomic layer depositioncitations
- 2015Studies on atomic layer deposition of IRMOF-8 thin filmscitations
- 2015Conduction and stability of holmium titanium oxide thin films grown by atomic layer depositioncitations
- 2015Selective etching of focused gallium ion beam implanted regions from silicon as a nanofabrication methodcitations
- 2015Atomic Layer Deposition and Characterization of Bi2Te3 Thin Filmscitations
- 2015(Et3Si)(2)Se as a precursor for atomic layer depositioncitations
- 2014Combining focused ion beam and atomic layer deposition in nanostructure fabricationcitations
- 2014Atomic Layer Deposition of Groups 4 and 5 Transition Metal Oxide Thin Filmscitations
- 2014Continuous-Wave Laser Annealing of a Si/SiO2 Superlatticecitations
- 2014Interface control of atomic layer deposited oxide coatings by filtered cathodic arc deposited sublayers for improved corrosion protectioncitations
- 2014Modification of Hematite Electronic Properties with Trimethyl Aluminum to Enhance the Efficiency of Photoelectrodescitations
- 2014Holmium and titanium oxide nanolaminates by atomic layer depositioncitations
- 2014Sealing of Hard CrN and DLC Coatings with Atomic Layer Depositioncitations
- 2014Atomic Layer Deposition of Noble Metals and Their Oxidescitations
- 2014Heteroleptic Precursors for Atomic Layer Depositioncitations
- 2014Metal oxide films
- 2013Tantalum oxide nanocoatings prepared by atomic layer and filtered cathodic arc deposition for corrosion protection of steelcitations
- 2013Atomic Layer Deposition and Characterization of Vanadium Oxide Thin Filmscitations
- 2013Studies on atomic layer deposition of MOF-5 thin filmscitations
- 2013Studies on atomic layer deposition of MOF-5 thin filmscitations
- 2013AlxTayOz Mixture Coatings Prepared Using Atomic Layer Deposition for Corrosion Protection of Steelcitations
- 2013Low temperature atomic layer deposition of noble metals using ozone and molecular hydrogen as reactantscitations
- 2013Hydrogen-argon plasma pre-treatment for improving the anti-corrosion properties of thin Al2O3 films deposited using atomic layer deposition on steelcitations
- 2012Study of amorphous lithium silicate thin films grown by atomic layer depositioncitations
- 2012Lithium Phosphate Thin Films Grown by Atomic Layer Depositioncitations
- 2012Preparation of regularly structured nanotubular TiO2 thin films on ITO and their modification with thin ALD-grown layerscitations
- 2012Optical and Dielectric Characterization of Atomic Layer Deposited Nb2O5 Thin Filmscitations
- 2011Failure mechanism of thin Al2O3 coatings grown by atomic layer deposition for corrosion protection of carbon steelcitations
- 2011Corrosion Protection of Steel with Oxide Nanolaminates Grown by Atomic Layer Depositioncitations
- 2011Iridium metal and iridium oxide thin films grown by atomic layer deposition at low temperaturescitations
- 2011Electrochemical and time-of-flight secondary ion mass spectrometry analysis of ultra-thin metal oxide (Al2O3 and Ta2O5) coatings deposited by atomic layer deposition on stainless steelcitations
- 2011Electrochemical and time-of-flight secondary ion mass spectrometry analysis of ultra-thin metal oxide (Al2O3 and Ta2O5) coatings deposited by atomic layer deposition on stainless steelcitations
- 2011Atomic Layer Deposition of GeTe
- 2011Atomic Layer Deposition and Characterization of Aluminum Silicate Thin Films for Optical Applicationscitations
- 2011Crystal structures and thermal properties of some rare earth alkoxides with tertiary alcoholscitations
- 2011Low-temperature atomic layer deposition of Al2O3 thin coatings for corrosion protection of steelcitations
- 2010High temperature atomic layer deposition of Ruthenium from N,N-dimethyl-1-ruthenocenylethylaminecitations
- 2010Silver Coated Platinum Core–Shell Nanostructures on Etched Si Nanowires: Atomic Layer Deposition (ALD) Processing and Application in SERScitations
- 2010Atomic layer deposition and characterization of zirconium oxide-erbium oxide nanolaminatescitations
- 2010Selective-area atomic layer deposition using poly(vinyl pyrrolidone) as a passivation layercitations
- 2009Electrical properties of thin zirconium and hafnium oxide high-k gate dielectrics grown by atomic layer deposition from cyclopentadienyl and ozone precursorscitations
- 2009Atomic layer deposition of high-k oxides of the group 4 metals for memory applicationscitations
- 2009Atomic layer deposition of metal tellurides and selenides using alkylsilyl compounds of tellurium and seleniumcitations
- 2009Behavior of zirconium oxide films processed from novel monocyclopentadienyl precursors by atomic layer depositioncitations
- 2009Metallic Ir, IrO2 and Pt Nanotubes and Fibers by Electrospinning and Atomic Layer Deposition
- 2009The preparation of reusable magnetic and photocatalytic composite nanofibers by electrospinning and atomic layer depositioncitations
- 2009Advanced thin film technology for ultrahigh resolution x-ray microscopycitations
- 2009Irradiation effect on dielectric properties of hafnium and gadolinium oxide gate dielectricscitations
- 2009Alkylsilyl compounds of selenium and tellurium
- 2009Study on atomic layer deposition of amorphous rhodium oxide thin filmscitations
- 2009Atomic layer deposition of iridium thin films by consecutive oxidation and reduction stepscitations
- 2009Explosive crystallization in atomic layer deposited mixed titanium oxidescitations
- 2008Atomic layer deposition of iridium oxide thin films from Ir(acac)₃ and ozonecitations
- 2008Coating of highly porous fiber matrices by atomic layer depositioncitations
- 2008Atomic layer deposition of MgF2 thin films using TaF5 as a novel fluorine sourcecitations
- 2008Identification of spatial localization and energetic position of electrically active defects in amorphous high-k dielectrics for advanced devicescitations
- 2008Atomic layer deposition of platinum oxide and metallic platinum thin films from Pt(acac)₂ and ozonecitations
- 2008Selective-area atomic layer deposition using poly(methyl methacrylate) films as maskcitations
- 2007Study of a novel ALD process for depositing MgF2 thin filmscitations
- 2007Radical-enhanced atomic layer deposition of silver thin films using phosphine-adducted silver carboxylatescitations
- 2007Hollow inorganic nanospheres and nanotubes with tunable wall thicknesses by atomic layer deposition on self-assembled polymeric templatescitations
- 2007Hollow inorganic nanospheres and nanotubes with tunable wall thicknesses by atomic layer deposition on self-assembled polymeric templatescitations
- 2007Radical enhanced atomic layer deposition of titanium dioxidecitations
- 2007Atomic layer deposition in nanotechnology applications
- 2007Ruthenium/aerogel nanocomposites via atomic layer depositioncitations
- 2007Atomic layer deposition of titanium disulfide thin filmscitations
- 2006Atomic layer deposition and properties of lanthanum oxide and lanthanum-aluminum oxide filmscitations
- 2006Atomic layer deposition of ferroelectric bismuth titanate Bi4Ti3O12 thin filmscitations
- 2006Free-standing inductive grid filter for infrared radiation rejectioncitations
- 2005Aging of electroluminescent ZnScitations
- 2005Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Filmscitations
- 2005New approach to the ALD of Bismuth silicatescitations
- 2005Atomic layer deposition of hafnium dioxide thin films from hafnium tetrakis(dimethylamide) and watercitations
- 2005Thin film deposition methods for CulnSe(2) solar cellscitations
- 2005Atomic layer deposition of molybdenum nitride thin films for Cu metallizationscitations
- 2004Atomic layer deposition of noble metalscitations
- 2001Electrochemical quartz crystal microbalance study of the electrodeposition mechanisms of CuInSe 2 thin filmscitations
Places of action
| Organizations | Location | People |
|---|
article
Identification of spatial localization and energetic position of electrically active defects in amorphous high-k dielectrics for advanced devices
Abstract
In this work, we report the use of the conductance transient technique (GTT) to evaluate disordered-induced gap states (DIGS) in gate dielectrics of metal-insulator-semiconductor (MIS) structures. These states are electrically active defects inside the dielectric bulk which are preferentially located at regions near the dielectric/semiconductor interface. Conductance transients occur when the MIS structure is driven from deep to weak inversion, at various frequencies and temperatures, allowing us to obtain contour line maps of defects spatially and energetically distributed inside the dielectric. This method has been applied to evaluate DIGS densities in advanced high-k gate dielectrics, such as HfO2, Al2O3, TiO2, Silicates and other mixtures grown on silicon substrates by atomic layer deposition under different process conditions. Commonly, high DIGS densities involve low interface state densities D-it and vice versa, indicating that there is some kind of interaction or evolution between these two types of defects or traps. An explanation for the dynamics dictating the transformation of interface states to DIGS states is a key point in determining the quality of the dielectric films. (C) 2007 Elsevier B.V. All rights reserved.