| People | Locations | Statistics |
|---|---|---|
| Naji, M. |
| |
| Motta, Antonella |
| |
| Aletan, Dirar |
| |
| Mohamed, Tarek |
| |
| Ertürk, Emre |
| |
| Taccardi, Nicola |
| |
| Kononenko, Denys |
| |
| Petrov, R. H. | Madrid |
|
| Alshaaer, Mazen | Brussels |
|
| Bih, L. |
| |
| Casati, R. |
| |
| Muller, Hermance |
| |
| Kočí, Jan | Prague |
|
| Šuljagić, Marija |
| |
| Kalteremidou, Kalliopi-Artemi | Brussels |
|
| Azam, Siraj |
| |
| Ospanova, Alyiya |
| |
| Blanpain, Bart |
| |
| Ali, M. A. |
| |
| Popa, V. |
| |
| Rančić, M. |
| |
| Ollier, Nadège |
| |
| Azevedo, Nuno Monteiro |
| |
| Landes, Michael |
| |
| Rignanese, Gian-Marco |
|
Tarnowski, Michał
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (20/20 displayed)
- 2021Shaping the structure and properties of titanium and Ti6Al7Nb titanium alloy in low-temperature plasma nitriding processescitations
- 2021Formation of Nitrogen Doped Titanium Dioxide Surface Layer on NiTi Shape Memory Alloycitations
- 2021Plasma modification of carbon coating produced by RF CVD on oxidized NiTi shape memory alloy under glow-discharge conditionscitations
- 2021The Microstructure and Properties of Carbon Thin Films on Nanobainitic Steelcitations
- 2020Influence of nitrided and nitrocarburised layers on the functional properties of nitrogen-doped soft carbon-based coatings deposited on 316L steel under DC glow-discharge conditionscitations
- 2020Effect of nitriding conditions of Ti6Al7Nb on microstructure of TiN surface layercitations
- 2020TEM investigations of active screen plasma nitrided Ti6Al4V and Ti6Al7Nb alloyscitations
- 2020Effect of Nitrided and Nitrocarburised Austenite on Pitting and Crevice Corrosion Resistance of 316 LVM Steel Implantscitations
- 2019TEM studies of low temperature cathode-plasma nitrided Ti6Al7Nb alloycitations
- 2018Structure and hemocompatibility of nanocrystalline titanium nitride produced under glow-discharge conditionscitations
- 2018Structure and physico-mechanical properties of low temperature plasma treated electrospun nanofibrous scaffolds examined with atomic force microscopycitations
- 2018Modification of titanium and its alloys implants by low temperature surface plasma treatments for cardiovascular applicationscitations
- 2018Structure and properties of composite surface layers produced on NiTi shape memory alloy by a hybrid methodcitations
- 2017Properties of Ti-6Al-7Nb titanium alloynitrocarburized under glow discharge conditions
- 2017Odporność korozyjna warstw azotonawęglanych wytworzonych na stopie tytanu Ti6Al7Nbcitations
- 2017Corrosion resistance of NiTi shape memory alloy after hybrid surface treatment using low-temperature plasmacitations
- 2017Influence of amorphous carbon layers on tribological properties of polyetheretherketone composite in contactwith nitrided layer produced on Ti6Al4V titanium alloycitations
- 2016Cathodic Cage Plasma Nitriding of Ti6Al4V Alloycitations
- 2016Wpływ topografii powierzchni na odporność korozyjną stopu z pamięcią kształtu NiTi po procesie azotowania jarzeniowego w niskotemperaturowej plazmie / Influence of surface topography on the corrosion resistance of NiTi shape memory alloy nitrided at low-temperature plasma process
- 2015The importance of surface topography for the biological properties of nitrided diffusion layers Produced on Ti6Al4V titanium alloycitations
Places of action
| Organizations | Location | People |
|---|
article
Effect of nitriding conditions of Ti6Al7Nb on microstructure of TiN surface layer
Abstract
Presented experiments were aimed at comparing microstructure of the TiN layer produced on Ti6Al7Nb alloy being gas nitrided (GN) or glow discharge nitrided with either active screen (GD-ASN) or at cathode potential (GD-CPN). They were treated at 620 °C, 680 °C, 740 °C and 830 °C for 6 h. The transmission electron microscopy investigations showed that thickness of the TiN layer depends less on average temperature of nitrided piece, but more on temperature of its surface, being the highest for the GD-CPN process. The growth of TiN layer during the GN treatment proceeds mainly towards the core and to a lesser extent at the surface. The former process is controlled by chemisorption and inward diffusion of nitrogen atoms, while the latter by outward diffusion of titanium. The factor controlling the growth of TiN during the GD-ASN treatment is exclusively the flux of the titanium atoms sputtered from the active screen. The thickness of the TiN layer produced during the GD-CPN process in the temperature range between 680 °C and 830 °C is controlled in the same way as during the GN, except the fact that bombardment of the processed material with nitrogen ions strongly raises the surface temperature.