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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Van Den Beld, Wesley Theodorus Eduardus
University of Twente
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (6/6 displayed)
- 2024Oxidation of thin film binary entropy alloys
- 2022Relation between composition and fracture strength in off-stoichiometric metal silicide free-standing membranescitations
- 2022Fracture Toughness of Free-Standing ZrSiₓ Thin Films Measured Using Crack-on-a-Chip Methodcitations
- 2021Strengthening ultrathin Si3N4 membranes by compressive surface stresscitations
- 2021Hydrogen etch resistance of aluminium oxide passivated graphitic layerscitations
- 2019Atomic H diffusion and C etching in multilayer graphene monitored using a y based optical sensorcitations
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article
Relation between composition and fracture strength in off-stoichiometric metal silicide free-standing membranes
Abstract
<p>In this work, we investigated the influence of composition on the polycrystalline structure, elastic properties and fracture strength, of Zr<sub>x</sub>Si<sub>1-x</sub>, Nb<sub>x</sub>Si<sub>1-x,</sub> and Mo<sub>x</sub>Si<sub>1-x</sub> free-standing thin films that were deposited by magnetron sputtering and subsequently annealed at 500 °C. Despite deviations from the stoichiometric composition, the crystalline structure of all films, except for the most Zr-rich Zr<sub>x</sub>Si<sub>1-x</sub>, corresponded to their respective stoichiometric disilicide structures, without the formation of a second-phase. Off-stoichiometry was found to be accompanied by the presence of lattice defects and a decrease of the grain size, which bring about a lower tensile stress in the films. The dependence of the fracture strength on the composition was remarkably similar for the three silicides, with the lowest and highest strength values occurring for samples with 30% and 37–40% of metal content, respectively. The observed dependence of strength on composition was attributed to the combination of the Hall-Petch effect, changes in the morphology and strength of grain boundaries, and the enhancement of crystal plasticity due to lattice defects induced by off-stoichiometry.</p>