| People | Locations | Statistics |
|---|---|---|
| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Wouters, Benny
Vrije Universiteit Brussel
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (13/13 displayed)
- 2024On the Interaction between PEDOT:PSS Dispersions and Aluminium Electrodes for Solid State Electrolytic Capacitorscitations
- 2024Application of operando ORP-EIS for the in-situ monitoring of acid anion incorporation during anodizingcitations
- 2024Effect of Impregnation of PEDOT:PSS in Etched Aluminium Electrodes on the Performance of Solid State Electrolytic Capacitors
- 2024Study of Solid-State Diffusion Impedance in Li-Ion Batteries Using Parallel-Diffusion Warburg Modelcitations
- 2023Operando odd random phase electrochemical impedance spectroscopy (ORP-EIS) for in-situ monitoring of the Zr-based conversion coating growth in the presence of (in)organic additivescitations
- 2023Differentiating between the diffusion of water and ions from aqueous electrolytes in organic coatings using an integrated spectro-electrochemical techniquecitations
- 2023Electrochemical impedance spectroscopy beyond linearity and stationarity - a critical reviewcitations
- 2023The time-varying effect of thiourea on the copper electroplating process with industrial copper concentrationscitations
- 2022An ex situ and operando analysis of thiourea consumption and activity during a simulated copper electrorefining processcitations
- 2021Best Linear Time-Varying Approximation of a General Class of Nonlinear Time-Varying Systemscitations
- 2021An operando ORP-EIS study of the copper reduction reaction supported by thiourea and chlorides as electrorefining additivescitations
- 2020EIS comparative study and critical Equivalent Electrical Circuit (EEC) analysis of the native oxide layer of additive manufactured and wrought 316L stainless steelcitations
- 2019Characterisation of rapid water uptake in model coatings using instantaneous impedance
Places of action
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article
The time-varying effect of thiourea on the copper electroplating process with industrial copper concentrations
Abstract
<p>Electrorefining is the process of choice to purify several metals, among which is copper. A crucial process parameter in electrorefining, and electroplating in general, is the additive activity. Several additives are introduced to the electrolyte to ensure a morphological smooth copper deposit. Thiourea is a crucial but complex additive used in copper electrorefining, it is known to degenerate and both the reaction product as thiourea itself can complex with the copper ions. Unfortunately, time dependent additive studies and mechanistic knowledge of the effect of aged electrolyte on the cathodic part of the electrorefining process are scarce. In this work, operando Odd Random Phase Electrochemical Impedance Spectroscopy (ORP-EIS) is used to study the electrochemistry of a copper plating system containing industrial copper concentrations. The approach applied enables the investigation of the time-varying effect of additives, in this case thiourea and chlorides, assisting the electroplating of copper.</p>