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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Pintelon, Rik
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Topics
Publications (7/7 displayed)
- 2021Best Linear Time-Varying Approximation of a General Class of Nonlinear Time-Varying Systemscitations
- 2021An operando ORP-EIS study of the copper reduction reaction supported by thiourea and chlorides as electrorefining additivescitations
- 2020Local bending stiffness identification of beams using simultaneous Fourier-series fitting and shearography (vol 443, pg 764, 2019)
- 2019Local bending stiffness identification of beams using simultaneous Fourier-series fitting and shearographycitations
- 2010Odd random phase multisine EIS as a detection method for the onset of corrosion of coated steel
- 2007Practical aspects of continuous-time modelling from noisy observations
- 2004Electrochemical impedance spectroscopy in the presence of non-linear distortions and non-stationary behaviour Part I: theory and validation
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article
An operando ORP-EIS study of the copper reduction reaction supported by thiourea and chlorides as electrorefining additives
Abstract
Additives are used in metal electroreduction processes to obtain a smooth and optimal metal deposit. However, the mechanism with which these additives influence the metal deposition is poorly understood. Operando odd random phase electrochemical impedance spectroscopy (ORP-EIS) experiments have been performed to study the effect of a chloride-thiourea additive mixture on the reduction of copper ions in a sulfuric acid solution. This additive mixture is crucial in the copper electrorefining process. An optimal experimental design and a well-founded methodology is applied to study this complex additive mixture. The ORP-EIS data is studied to analyze non-stationarities and non-linearities and the time-varying impedance is resolved when necessary. Two equivalent circuits are proposed to model the impedance data and the model parameters are linked to physical processes in the system. The use of the time-varying impedance when studying thiourea in a plating process and the use of distributed circuit elements in the EIS model is discussed.