| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Thomas, Shibin
University of Southampton
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (12/12 displayed)
- 2024Electrodeposition of 2D layered tungsten diselenide thin films using a single source precursorcitations
- 20222D material based optoelectronics by electroplating
- 20222D material based optoelectronics by electroplating
- 2021Electrodeposited WS 2 monolayers on patterned graphenecitations
- 2021Tungsten disulfide thin films via electrodeposition from a single source precursorcitations
- 2021Lateral growth of MoS2 2D material semiconductors over an insulator via electrodepositioncitations
- 2021Lateral growth of MoS 2 2D material semiconductors over an insulator via electrodepositioncitations
- 2020Large-area electrodeposition of few-layer MoS2 on graphene for 2D material heterostructurescitations
- 2020Large-area electrodeposition of few-layer MoS 2 on graphene for 2D material heterostructurescitations
- 2020Electrodeposition of MoS2 from dichloromethanecitations
- 2018Single step electrodeposition process using ionic liquid to grow highly luminescent silicon/rare earth (Er, Tb) thin films with tunable compositioncitations
- 2018Role of electrochemical process parameters on the electrodeposition of silicon from 1-butyl-1-methylpyrrolidinium bis(trifluoromethanesulfonyl)imide ionic liquidcitations
Places of action
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article
Role of electrochemical process parameters on the electrodeposition of silicon from 1-butyl-1-methylpyrrolidinium bis(trifluoromethanesulfonyl)imide ionic liquid
Abstract
The electrodeposition from Room Temperature Ionic Liquids (RTILs) has recently emerged as a low cost technique for the growth of group IV thin films or nanostructures giving some promising alternative to classical physical vapour or chemical vapour deposition techniques. As a relatively new field of research, only few studies exist describing the growth mechanism of electrodeposition from RTILs, especially for Si films. In the present work, Cyclic Voltammetry (CV), Electrochemical Quartz Crystal Microbalance (EQCM) and potentiostatic electrodeposition techniques have been used to study the role of the applied potential, the concentration of electroactive species, the temperature, and the use of organic additive on the electrodeposition of Si from 1-butyl-1-methylpyrrolidinium bis(trifluoromethanesulfonyl)imide ionic liquid. The demonstrated investigation of the influence of these parameters on the purity and morphological features gives a better control over the growth of Si thin films and optimizes the technique to grow Si with structural properties suitable for specific applications.