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Naji, M. |
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Motta, Antonella |
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Aletan, Dirar |
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Mohamed, Tarek |
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Ertürk, Emre |
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Taccardi, Nicola |
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Kononenko, Denys |
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Petrov, R. H. | Madrid |
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Alshaaer, Mazen | Brussels |
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Bih, L. |
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Casati, R. |
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Muller, Hermance |
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Kočí, Jan | Prague |
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Šuljagić, Marija |
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Kalteremidou, Kalliopi-Artemi | Brussels |
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Azam, Siraj |
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Ospanova, Alyiya |
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Blanpain, Bart |
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Ali, M. A. |
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Popa, V. |
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Rančić, M. |
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Ollier, Nadège |
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Azevedo, Nuno Monteiro |
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Landes, Michael |
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Rignanese, Gian-Marco |
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Gondran, Chantal
Université Grenoble Alpes
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (7/7 displayed)
- 2023Aptamer conjugated Si nanowire network/poly(pyrrole)-NTA structure for electrochemical sensingcitations
- 2021A cobalt oxide–polypyrrole nanocomposite as an efficient and stable electrode material for electrocatalytic water oxidationcitations
- 2020Voltammetric sensing of recombinant viral dengue virus 2 NS1 based on Au nanoparticle–decorated multiwalled carbon nanotube compositescitations
- 2010Contribution of iron clays in the preparation of amperometric biosensors : Study of the interaction of hemoglobin with Clays and Layered Doubles Hydroxides.
- 2008Electrochemical investigation of the influence of thin SiO x films deposited on gold on charge transfer characteristicscitations
- 2008Detection of carbohydrate-binding proteins by oligosaccharide-modified polypyrrole interfaces using electrochemical surface plasmon resonancecitations
- 2008Electrochemical investigation of the influence of thin SiO<sub><i>x</i></sub> films deposited on gold on charge transfer characteristicscitations
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article
Electrochemical investigation of the influence of thin SiO<sub><i>x</i></sub> films deposited on gold on charge transfer characteristics
Abstract
The paper reports on the investigation of the electrochemical behavior of a thin gold film electrode coated with silicon dioxide (SiO<sub><i>x</i></sub>) layers of increasing thickness. Stable thin films of amorphous silica (SiO<sub><i>x</i></sub>) were deposited on glass slides coated with a 5 nm adhesion layer of titanium and 50 nm of gold, using plasma-enhanced chemical vapor deposition (PECVD) technique. Scanning electrochemical microscopy (SECM) and electrochemical impedance spectroscopy (EIS) were used to investigate the electrochemical behavior of the interfaces. In the case of SECM, the influence of the SiO<sub><i>x</i></sub> thicknesses on the electron transfer kinetics of three redox mediators was investigated. Normalized current–distance curves (approach curves) were fitted to the theoretical model in order to find the effective heterogeneous first order rate constant (<i>k</i><sub>eff</sub>) at the sample. EIS was in addition used to confirm the diffusion barrier character of the SiO<sub><i>x</i></sub> interlayer.