| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Wittstock, Gunther
Carl von Ossietzky Universität Oldenburg
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (10/10 displayed)
- 2023Nanoporous Gold: From Structure Evolution to Functional Properties in Catalysis and Electrochemistry
- 2021An Electrically Conducting Three‐Dimensional Iron–Catecholate Porous Frameworkcitations
- 2020Thermally Driven Ag–Au Compositional Changes at the Ligament Surface in Nanoporous Gold: Implications for Electrocatalytic Applicationscitations
- 2015Magnetically Controlled Release of Dispersed Iron Oxide Nanoparticles from Imprinted Organic Thin Filmscitations
- 2014Conducting Polymers as Binder Additives for Cathodes in Li Ion Batterycitations
- 2008Polarization Modulation Infrared Reflection Absorption Spectroscopy Investigations of Thin Silica Films Deposited on Gold. 2. Structural Analysis of a 1,2-Dimyristoyl- sn -glycero-3-phosphocholine Bilayercitations
- 2008Electrochemical investigation of the influence of thin SiO x films deposited on gold on charge transfer characteristicscitations
- 2008Electrochemical investigation of the influence of thin SiO<sub><i>x</i></sub> films deposited on gold on charge transfer characteristicscitations
- 2007PM IRRAS Investigation of Thin Silica Films Deposited on Gold. Part 1. Theory and Proof of Conceptcitations
- 2007Scanning Electrochemical Microscopy (SECM) Based Detection of Oligonucleotide Hybridization and Simultaneous Determination of the Surface Concentration of Immobilized Oligonucleotides on Goldcitations
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article
Electrochemical investigation of the influence of thin SiO<sub><i>x</i></sub> films deposited on gold on charge transfer characteristics
Abstract
The paper reports on the investigation of the electrochemical behavior of a thin gold film electrode coated with silicon dioxide (SiO<sub><i>x</i></sub>) layers of increasing thickness. Stable thin films of amorphous silica (SiO<sub><i>x</i></sub>) were deposited on glass slides coated with a 5 nm adhesion layer of titanium and 50 nm of gold, using plasma-enhanced chemical vapor deposition (PECVD) technique. Scanning electrochemical microscopy (SECM) and electrochemical impedance spectroscopy (EIS) were used to investigate the electrochemical behavior of the interfaces. In the case of SECM, the influence of the SiO<sub><i>x</i></sub> thicknesses on the electron transfer kinetics of three redox mediators was investigated. Normalized current–distance curves (approach curves) were fitted to the theoretical model in order to find the effective heterogeneous first order rate constant (<i>k</i><sub>eff</sub>) at the sample. EIS was in addition used to confirm the diffusion barrier character of the SiO<sub><i>x</i></sub> interlayer.